G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREINNON-LINEAR OPTICSFREQUENCY-CHANGING OF LIGHTOPTICAL LOGIC ELEMENTSOPTICAL ANALOGUE/DIGITAL CONVERTERSThe following IPC groups are not in the CPC scheme. The subject matter for these IPC groups is classified in the following CPC groups:
Subject matter covered by these groups is classified in the following CPC groups: G02F1/13357 covered by G02F1/1336 and subgroups In this subclass non-limiting references (in the sense of paragraph 39 of the Guide to the IPC) may still be displayed in the scheme. G02F1/00 G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulatingNon-linear optics This group covers only : devices or arrangements, e.g. cells, the optical operation of which is modified by changing the optical properties of the medium of the devices or arrangements by the influence or control of physical parameters, e.g. electric fields, electric current, magnetic fields, sound or mechanical vibrations, stress or thermal effects; devices or arrangements in which the electric or magnetic field component of the light beams influences the optical properties of the medium, i.e. non-linear optics; control of light by electromagnetic waves, e.g. radio waves, or by electrons or other elementary particles. G02F1/0009Materials thereforG02F1/0009 and subgroups contain mostly non-patent literature G02F1/0018Electro-optical materials G02F1/0027Ferro-electric materials G02F1/0036Magneto-optical materials G02F1/0045Liquid crystals characterised by their physical properties G02F1/0054Structure, phase transitions, NMR, ESR, Moessbauer spectra G02F1/0063Optical properties, e.g. absorption, reflection or birefringence materials for non-linear optics G02F1/355 G02F1/0072Mechanical, acoustic, electro-elastic, magneto-elastic properties G02F1/0081Electric or magnetic properties G02F1/009Thermal properties G02F1/01for the control of the intensity, phase, polarisation or colour  G02F1/29, G02F1/35 take precedence G02F1/0102Constructional details, not otherwise provided for in this subclass G02F1/0105Illuminating devices G02F1/0107Gaskets, spacers or sealing of cells; Filling and closing of cells G02F1/011in optical waveguides, not otherwise provided for in this subclass G02F1/0113Glass-based, e.g. silica-based, optical waveguides G02F1/0115in optical fibres G02F1/0118by controlling the evanescent coupling of light from a fibre into an active, e.g. electro-optic, overlay G02F1/0121Operation of devices; Circuit arrangements, not otherwise provided for in this subclass G02F1/0123Circuits for the control or stabilisation of the bias voltage, e.g. automatic bias control [ABC] feedback loops G02F1/0126Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass G02F1/0128based on electro-mechanical, magneto-mechanical, elasto-optic effects G02F1/0131based on photo-elastic effects, e.g. mechanically induced birefringence G02F1/0134in optical waveguides G02F1/0136for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation G02F1/0353 takes precedence G02F1/0139Polarisation scrambling devices; Depolarisers G02F1/0142TE-TM mode conversion G02F1/0144TE-TM mode separation G02F1/0147based on thermo-optic effects G02F1/132 takes precedence G02F1/015based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction G02F1/03 takes precedence G02F1/0151modulating the refractive index G02F1/0152using free carrier effects, e.g. plasma effect G02F1/0153using electro-refraction, e.g. Kramers-Kronig relation G02F1/0154using electro-optic effects, e.g. linear electro optic [LEO], Pockels, quadratic electro optical [QEO] or Kerr effect G02F1/0155modulating the optical absorption G02F1/0156using free carrier absorption G02F1/0157using electro-absorption effects, e.g. Franz-Keldysh [FK] effect or quantum confined stark effect [QCSE] G02F1/0158Blue-shift of the absorption band G02F1/0159Red-shift of the absorption band G02F1/017Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells G02F1/01708in an optical wavequide structure G02F1/01716Optically controlled superlattice or quantum well devices G02F1/01725Non-rectangular quantum well structures, e.g. graded or stepped quantum wells G02F1/01733Coupled or double quantum wells G02F1/01741Asymmetrically coupled or double quantum wells G02F1/0175with a spatially varied well profile, e.g. graded or stepped quantum wells G02F1/01758with an asymmetric well profile, e.g. asymmetrically stepped quantum wells G02F1/01766Strained superlattice devices; Strained quantum well devices G02F1/01775involving an inter-subband transition in one well, e.g. e1->e2 G02F1/01783Quantum wires G02F1/01791Quantum boxes or quantum dots G02F1/025in an optical waveguide structure G02F1/017, G02F1/2257 take precedence G02F1/03based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect G02F1/061 takes precedence G02F1/0305Constructional arrangements G02F1/0327 - G02F1/05 take precedence G02F1/0311Structural association of optical elements, e.g. lenses, polarizers, phase plates, with the crystal G02F1/0316Electrodes G02F1/0322Arrangements comprising two or more independently controlled crystals G02F1/0327Operation of the cell; Circuit arrangements G02F1/05 takes precedence G02F1/0333addressed by a beam of charged particles G02F1/05 takes precedence G02F1/0338structurally associated with a photoconductive layer or having photo-refractive properties G02F1/05 takes precedence G02F1/0344controlled by a high-frequency electromagnetic wave component in an electric waveguide G02F1/0356, G02F1/05, G02F1/2255, G02F1/3134 take precedence G02F1/035in an optical waveguide structure G02F1/0353involving an electro-optic TE-TM mode conversion G02F1/0356controlled by a high-frequency electromagnetic wave component in an electric waveguide structure G02F1/05with ferro-electric properties G02F1/035, G02F1/055 take precedence G02F1/0508specially adapted for gating or modulating in optical waveguides G02F1/0516Operation of the cell; Circuit arrangements G02F1/0525addressed by a beam of charged particles G02F1/0533structurally associated with a photo-conductive layer G02F1/0541using photorefractive effects G02F1/055the active material being a ceramic G02F1/035 takes precedence G02F1/0551Constructional details G02F1/0553specially adapted for gating or modulating in optical waveguides G02F1/0555Operation of the cell; Circuit arrangements G02F1/0556specially adapted for a particular application G02F1/0558structurally associated with a photoconductive layer or exhibiting photo-refractive properties G02F1/061based on electro-optical organic material G02F1/07, G02F1/13 take precedence G02F1/065in an optical waveguide structure G02F1/07based on electro-optical liquids exhibiting Kerr effect G02F1/073specially adapted for gating or modulating in optical waveguides G02F1/076Operation of the cell; Circuit arrangements G02F1/09based on magneto-optical elements, e.g. exhibiting Faraday effect G02F1/091based on magneto-absorption or magneto-reflection G02F1/092Operation of the cell; Circuit arrangements G02F1/093used as non-reciprocal devices, e.g. optical isolators, circulators G02F1/0955 takes precedence G02F1/094based on magnetophoretic effect G02F1/095in an optical waveguide structure G02F1/0955used as non-reciprocal devices, e.g. optical isolators, circulators G02F1/11based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves acousto-optical deflection G02F1/33 G02F1/113Circuit or control arrangements G02F1/116using an optically anisotropic medium, wherein the incident and the diffracted light waves have different polarizations, e.g. acousto-optic tunable filter [AOTF] G02F1/125 takes precedence G02F1/125in an optical waveguide structure G02F1/13based on liquid crystals, e.g. single liquid crystal display cells G02F1/1303Apparatus specially adapted to the manufacture of LCDs G02F1/1306Details G02F1/1309Repairing; Testing G02F1/1313specially adapted for a particular application G02F1/1316Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor G02F1/132Thermal activation of liquid crystals exhibiting a thermo-optic effect G02F1/1323Arrangements for providing a switchable viewing angle G02F1/1326Liquid crystal optical waveguides or liquid crystal cells specially adapted for gating or modulating between optical waveguides G02F1/133Constructional arrangementsOperation of liquid crystal cellsCircuit arrangements arrangements or circuits for control of liquid crystal elements in a matrix, not structurally associated with these elements G09G3/36 G02F1/13306Circuit arrangements or driving methods for the control of single liquid crystal cells G02F1/132, G02F1/133382 take precedence G02F1/13312Circuits comprising photodetectors for purposes other than feedback G02F1/13318Circuits comprising a photodetector G02F1/13324Circuits comprising solar cells G02F1/1333Constructional arrangements; Manufacturing methodsG02F1/135, G02F1/136 take precedence G02F1/133302Rigid substrates, e.g. inorganic substrates G02F1/133305Flexible substrates, e.g. plastics, organic film G02F1/133308Support structures for LCD panels, e.g. frames or bezels G02F1/133311Environmental protection, e.g. against dust or humidity G02F1/133314Back frames G02F1/133317Intermediate frames, e.g. between backlight housing and front frame G02F1/13332Front frames G02F1/133322Mechanical guidance or alignment of LCD panel support components G02F1/133325Assembling processes G02F1/133328Segmented frames G02F1/133331Cover glasses G02F1/133334Electromagnetic shields G02F1/133337Layers preventing ion diffusion, e.g. by ion absorption G02F1/13334Plasma addressed liquid crystal cells [PALC] G02F1/133342for double-sided displays G02F1/133345Insulating layers G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence G02F1/133348Charged particles addressed liquid crystal cells, e.g. controlled by an electron beam G02F1/133351Manufacturing of individual cells out of a plurality of cells, e.g. by dicing G02F1/133354Arrangements for aligning or assembling substrates G02F1/133357Planarisation layers G02F1/13336Combining plural substrates to produce large-area displays, e.g. tiled displays G02F1/133362Optically addressed liquid crystal cells G02F1/135 takes precedence G02F1/133365Cells in which the active layer comprises a liquid crystalline polymer G02F1/133368Cells having two substrates with different characteristics, e.g. different thickness or material G02F1/133371Cells with varying thickness of the liquid crystal layer G02F1/133374for displaying permanent signs or marks G02F1/133377Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel G02F1/13338Input devices, e.g. touch panels G02F1/133382Heating or cooling of liquid crystal cells other than for activation, e.g. circuits or arrangements for temperature control, stabilisation or uniform distribution over the cell G02F1/133385with cooling means, e.g. fans G02F1/133388with constructional differences between the display region and the peripheral region G02F1/133391Constructional arrangement for sub-divided displays G02F1/133394Piezoelectric elements associated with the cells G02F1/133397for suppressing after-image or image-sticking G02F1/1334based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals G02F1/13342Holographic polymer dispersed liquid crystals G02F1/13345Network or three-dimensional gels G02F1/13347working in reverse mode, i.e. clear in the off-state and scattering in the on-state G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors G02F1/133502Antiglare, refractive index matching layers G02F1/133504Diffusing, scattering, diffracting elements associated to illuminating devices G02F1/133606 G02F1/133507Films for enhancing the luminance G02F1/133509Filters, e.g. light shielding masks G02F1/133512Light shielding layers, e.g. black matrix G02F1/136209 takes precedence G02F1/133514Colour filters G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography G02F1/133519Overcoatings G02F1/133521Interference filters G02F1/133524Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides G02F1/133526Lenses, e.g. microlenses or Fresnel lenses G02F1/133528Polarisers G02F1/133531characterised by the arrangement of polariser or analyser axes G02F1/133533Colour selective polarisers G02F1/1347 takes precedence G02F1/133536Reflective polarizers G02F1/13362 takes precedence G02F1/133538with spatial distribution of the polarisation direction G02F1/133541Circular polarisers G02F1/133543Cholesteric polarisers G02F1/133545Dielectric stack polarisers G02F1/133548Wire-grid polarisers G02F1/13355Polarising beam splitters [PBS] G02F1/133553Reflecting elements associated to illuminating devices G02F1/133605 G02F1/133555Transflectors G02F1/133557Half-mirrors G02F1/13356characterised by the placement of the optical elements G02F1/133562on the viewer side G02F1/133565inside the LC elements, i.e. between the cell substrates G02F1/133567on the back side G02F1/1336Illuminating devices G02F1/133601for spatial active dimming G02F1/133602Direct backlight G02F1/133603with LEDs G02F1/133604with lamps G02F1/133605including specially adapted reflectors G02F1/133606including a specially adapted diffusing, scattering or light controlling members G02F1/133607the light controlling member including light directing or refracting elements, e.g. prisms or lenses G02F1/133608including particular frames or supporting means G02F1/133609including means for improving the color mixing, e.g. white G02F1/133611including means for improving the brightness uniformity G02F1/133612Electrical details G02F1/133613characterized by the sequence of light sources G02F1/133614using photoluminescence, e.g. phosphors illuminated by UV or blue light G02F1/133615Edge-illuminating devices, i.e. illuminating from the side G02F1/133616Front illuminating devices G02F1/133617Illumination with ultra-violet light; Luminescent elements or materials associated to the cell G02F1/133618for ambient light G02F1/13362providing polarized light, e.g. by converting a polarisation component into another one G02F1/133621providing coloured light G02F1/133617, G02F1/133533 take precedence G02F1/133622Colour sequential illumination G02F1/133623Inclined coloured light beams G02F1/133624characterised by their spectral emissions G02F1/133625Electron stream lamps G02F1/133626providing two modes of illumination, e.g. day-night G02F1/133627Projection-direct viewing G02F1/133628with cooling means G02F1/13363Birefringent elements, e.g. for optical compensation G02F1/133631with a spatial distribution of the retardation value G02F1/133632with refractive index ellipsoid inclined relative to the LC-layer surface G02F1/133633using mesogenic materials G02F1/133634the refractive index Nz perpendicular to the element surface being different from in-plane refractive indices Nx and Ny, e.g. biaxial or with normal optical axis G02F1/133635Multifunctional compensators G02F1/133636with twisted orientation, e.g. comprising helically oriented LC-molecules or a plurality of twisted birefringent sublayers G02F1/133637characterised by the wavelength dispersion G02F1/133638Waveplates, i.e. plates with a retardation value of lambda/n G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers G02F1/133703by introducing organic surfactant additives into the liquid crystal material G02F1/133707Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes G02F1/133711by organic films, e.g. polymeric films G02F1/133715by first depositing a monomer G02F1/133719with coupling agent molecules, e.g. silane G02F1/133723Polyimide, polyamide-imide G02F1/133726made of a mesogenic material G02F1/13373Disclination line; Reverse tilt G02F1/133734by obliquely evaporated films, e.g. Si or SiO₂ films G02F1/133738for homogeneous alignment G02F1/133742for homeotropic alignment G02F1/133746for high pretilt angles, i.e. higher than 15 degrees G02F1/133749for low pretilt angles, i.e. lower than 15 degrees G02F1/133753with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle G02F1/133757with different alignment orientations G02F1/133761with different pretilt angles G02F1/133765without a surface treatment G02F1/133769comprising an active, e.g. switchable, alignment layer G02F1/133773the alignment material or treatment being different for the two opposite substrates G02F1/133776having structures locally influencing the alignment, e.g. unevenness G02F1/13378by treatment of the surface, e.g. embossing, rubbing or light irradiation G02F1/133711, G02F1/133734, G02F1/133753 take precedence G02F1/133784by rubbing G02F1/133788by light irradiation, e.g. linearly polarised light photo-polymerisation G02F1/133792by etching G02F1/133796having conducting property G02F1/1339GasketsSpacersSealing of cells G02F1/13392spacers dispersed on the cell substrate, e.g. spherical particles, microfibres G02F1/13394spacers regularly patterned on the cell subtrate, e.g. walls, pillars G02F1/133377 takes precedence G02F1/13396Spacers having different sizes G02F1/13398Spacer materials; Spacer properties G02F1/1341Filling or closing of cells G02F1/13415Drop filling process G02F1/1343Electrodes reflective electrodes G02F1/133553 G02F1/134309characterised by their geometrical arrangement G02F1/134318having a patterned common electrode G02F1/134327Segmented, e.g. alpha numeric display G02F1/134336Matrix G02F1/134345Subdivided pixels, e.g. for grey scale or redundancy G02F1/134354the sub-pixels being capacitively coupled G02F1/134363for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS] G02F1/134372for fringe field switching [FFS] where the common electrode is not patterned G02F1/134381Hybrid switching mode, i.e. for applying an electric field with components parallel and orthogonal to the substrates G02F1/13439characterised by their electrical, optical, physical properties; materials therefor; method of making G02F1/1345Conductors connecting electrodes to cell terminals G02F1/13452Conductors connecting driver circuitry and terminals of panels G02F1/13454Drivers integrated on the active matrix substrate G02F1/136277 takes precedence G02F1/13456Cell terminals located on one side of the display only G02F1/13458Terminal pads G02F1/1347Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells G02F1/13471in which all the liquid crystal cells or layers remain transparent, e.g. FLC, ECB, DAP, HAN, TN, STN, SBE-LC cells G02F1/13475 takes precedence G02F1/13473for wavelength filtering or for colour display without the use of colour mosaic filters G02F1/13475in which at least one liquid crystal cell or layer is doped with a pleochroic dye, e.g. GH-LC cell G02F1/13476 takes precedence G02F1/13476in which at least one liquid crystal cell or layer assumes a scattering state G02F1/13478based on selective reflection G02F1/135Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied G02F1/133348 takes precedence G02F1/1351Light-absorbing or blocking layers G02F1/1352Light-reflecting layers G02F1/1354having a particular photoconducting structure or material G02F1/1355Materials or manufacture processes thereof G02F1/1357Electrode structure G02F1/1358the supplementary layer being a ferro-electric layer G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit G02F1/135 takes precedence G02F1/13606having means for reducing parasitic capacitance G02F1/13613the semiconductor element being formed on a first substrate and thereafter transferred to the final cell substrate G02F1/1362Active matrix addressed cells G02F1/134336, G02F1/134363 take precedence G02F1/136204Arrangements to prevent high voltage or static electricity failures G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element G02F1/136213Storage capacitors associated with the pixel electrode G02F1/136218Shield electrodes G02F1/136222Colour filters incorporated in the active matrix substrate G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer G02F1/136231for reducing the number of lithographic steps G02F1/136236using a grey or half tone lithographic process G02F1/13624having more than one switching element per pixel G02F1/136245having complementary transistors G02F1/13625Patterning using multi-mask exposure G02F1/136254Checking; Testing G02F1/136259Repairing; Defects G02F1/136263Line defects G02F1/136268Switch defects G02F1/136272Auxiliary lines G02F1/136277formed on a semiconductor substrate, e.g. of silicon G02F1/136281having a transmissive semiconductor substrate G02F1/136286Wiring, e.g. gate line, drain line G02F1/13629Multilayer wirings G02F1/136295Materials; Compositions; Manufacture processes G02F1/1365in which the switching element is a two-electrode device G02F1/136277 takes precedence G02F1/1368in which the switching element is a three-electrode device G02F1/136277 takes precedence G02F1/13685Top gates G02F1/137characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering G02F1/13706the liquid crystal having positive dielectric anisotropy G02F1/13712the liquid crystal having negative dielectric anisotropy G02F1/13718based on a change of the texture state of a cholesteric liquid crystal G02F1/13725based on guest-host interaction G02F1/13762, G02F1/13737, take precedence G02F1/13731based on a field-induced phase transition G02F1/13781 takes precedence G02F1/13737in liquid crystals doped with a pleochroic dye G02F1/13743based on electrohydrodynamic instabilities or domain formation in liquid crystals G02F1/1375using dynamic scattering G02F1/13756the liquid crystal selectively assuming a light-scattering state G02F1/1334, G02F1/13718 take precedence G02F1/13762containing luminescent or electroluminescent additives G02F1/13768based on magneto-optical effects G02F1/13775Polymer-stabilized liquid crystal layers G02F1/13781using smectic liquid crystals G02F1/141 takes precedence G02F1/13787Hybrid-alignment cells G02F1/1393 takes precedence G02F1/13793Blue phases G02F1/139based on orientation effects in which the liquid crystal remains transparent G02F1/1391Bistable or multi-stable liquid crystal cells G02F1/141 takes precedence G02F1/1392using a field-induced sign-reversal of the dielectric anisotropy G02F1/1393the birefringence of the liquid crystal being electrically controlled, e.g. ECB-, DAP-, HAN-, PI-LC cells G02F1/1396, G02F1/141 take precedence G02F1/1395Optically compensated birefringence [OCB]- cells or PI- cells G02F1/1396the liquid crystal being selectively controlled between a twisted state and a non-twisted state, e.g. TN-LC cell G02F1/141 takes precedence G02F1/1397the twist being substantially higher than 90°, e.g. STN-, SBE-, OMI-LC cells G02F1/1398the twist being below 90° G02F1/141using ferroelectric liquid crystals G02F1/1412Antiferroelectric liquid crystals G02F1/1414Deformed helix ferroelectric [DHL] G02F1/1416Details of the smectic layer structure, e.g. bookshelf, chevron, C1 and C2 G02F1/1418using smectic liquid crystals, e.g. based on the electroclinic effect G02F1/15based on an electrochromic effect G02F2001/1502complementary cell G02F2001/15025having an inorganic electrochromic layer and a second solid organic electrochromic layer G02F1/1503caused by oxidation-reduction reactions in organic liquid solutions, e.g. viologen solutions G02F1/1506caused by electrodeposition, e.g. electrolytic deposition of an inorganic material on or close to an electrode G02F1/1508using a solid electrolyte G02F1/1514characterised by the electrochromic material, e.g. by the electrodeposited material G02F2001/15145the electrochromic layer comprises a mixture of anodic and cathodic compounds G02F1/1516comprising organic material G02F1/15165Polymers G02F2001/1517Cyano complex compounds, e.g. Prussian blue G02F2001/1518Ferrocene compounds G02F1/1523comprising inorganic material G02F1/1524Transition metal compounds G02F1/15245based on iridium oxide or hydroxide G02F1/1525characterised by a particular ion transporting layer, e.g. electrolyte G02F1/153Constructional details G02F1/1533structural features not otherwise provided for G02F2001/1536additional, e.g. protective, layer inside the cell G02F1/155Electrodes G02F2001/1552Inner electrode, e.g. the electrochromic layer being sandwiched between the inner electrode and the support substrate---- this group, now to be changed, should already been created by implementation of a previous DOC14 prior to the one referred to above---- G02F2001/1555Counter electrode G02F2001/1557Side by side arrangements of working and counter electrodes G02F1/157Structural association of cells with optical devices, e.g. reflectors or illuminating devices G02F1/161GasketsSpacersSealing of cellsFilling or closing of cells G02F1/163Operation of electrochromic cells, e.g. electrodeposition cellsCircuit arrangements therefor G02F2001/1635the pixel comprises active switching elements, e.g. TFT G02F2001/164the electrolyte is made of polymers G02F1/165based on translational movement of particles in a fluid under the influence of an applied field G02F1/166characterised by the electro-optical or magneto-optical effect G02F1/167by electrophoresis G02F1/1671involving dry toners G02F1/1673by magnetophoresis G02F1/1675Constructional details G02F1/16753Structures for supporting or mounting cells, e.g. frames or bezels G02F1/16755Substrates G02F1/16756Insulating layers G02F1/16757Microcapsules G02F1/1676Electrodes G02F1/16761Side-by-side arrangement of working electrodes and counter-electrodes G02F1/16762having three or more electrodes per pixel G02F1/16766for active matrices G02F1/1677Structural association of cells with optical devices, e.g. reflectors or illuminating devices G02F2001/1678characterised by the composition or particle type G02F1/1679GasketsSpacersSealing of cellsFilling or closing of cells G02F1/1681having two or more microcells partitioned by walls, e.g. of microcup type G02F1/1685Operation of cellsCircuit arrangements affecting the entire cell G02F1/169based on orientable non-spherical particles having a common optical characteristic, e.g. suspended particles of reflective metal flakes G02F1/17based on variable-absorption elements not provided for in groups G02F1/015 - G02F1/169 G02F1/172based on a suspension of orientable dipolar particles, e.g. suspended particles displays G02F1/174based on absorption band-shift, e.g. Stark - or Franz-Keldysh effect G02F1/015, G02F1/178 take precedence G02F1/176using acid- based indicators G02F1/178based on pressure effects G02F1/195 takes precedence G02F1/19based on variable-reflection or variable-refraction elements not provided for in groups G02F1/015 - G02F1/169 G02F1/195by using frustrated reflection digital reflection using controlled total internal reflection G02F1/315 G02F1/21by interference G02F1/211Sagnac type G02F1/212Mach-Zehnder type G02F1/213Fabry-Perot type G02F1/215Michelson type G02F1/216using liquid crystals, e.g. liquid crystal Fabry-Perot filters G02F1/217Multimode interference type G02F1/218using semi-conducting materials G02F1/225in an optical waveguide structure G02F1/2252in optical fibres G02F1/2255controlled by a high-frequency electromagnetic component in an electric waveguide structure G02F1/2257the optical waveguides being made of semiconducting material G02F1/23for the control of the colour G02F1/03 - G02F1/21 take precedence G02F1/25as to hue or predominant wavelength G02F1/29for the control of the position or the direction of light beams, i.e. deflection G02F1/291Two-dimensional analogue deflection G02F1/292by controlled diffraction or phased-array beam steering controlled diffraction for optical switching G02F1/31 G02F1/293by another light beam, i.e. opto-optical deflection G02F1/294Variable focal length devices G02F1/295Analog deflection from or in an optical waveguide structure] G02F1/2955by controlled diffraction or phased-array beam steering controlled diffraction for optical waveguide switching G02F1/313 G02F1/31Digital deflection, i.e. optical switchingG02F1/33 takes precedence G02F1/311Cascade arrangement of plural switches G02F1/313in an optical waveguide structure G02F1/3131in optical fibres G02F1/3132of directional coupler type G02F1/3133the optical waveguides being made of semiconducting materials G02F1/3134controlled by a high-frequency electromagnetic wave component in an electric waveguide structure G02F1/3135Vertical structure G02F1/3136of interferometric switch type G02F1/3137with intersecting or branching waveguides, e.g. X-switches and Y-junctions G02F1/3138the optical waveguides being made of semiconducting materials G02F1/315based on the use of controlled internal reflection G02F1/33Acousto-optical deflection devices circuit or control arrangements therefor G02F1/113 G02F1/332comprising a plurality of transducers on the same crystal surface, e.g. multi-channel Bragg cell G02F1/335having an optical waveguide structure G02F1/35Non-linear optics G02F1/3501Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals G02F1/3503Structural association of optical elements, e.g. lenses, with the non-linear optical device G02F1/3505Coatings; Housings; Supports G02F1/3507Arrangements comprising two or more nonlinear optical devices G02F1/3509Shape, e.g. shape of end face G02F1/3511Self-focusing or self-trapping of light; Light-induced birefringence; Induced optical Kerr-effect G02F1/3513Soliton propagation G02F1/3515All-optical modulation, gating, switching, e.g. control of a light beam by another light beam G02F1/353, G02F1/37, G02F1/39 take precedence G02F1/3517using an interferometer G02F1/3519of Sagnac type, i.e. nonlinear optical loop mirror [NOLM] G02F1/3521using a directional coupler G02F1/3523Non-linear absorption changing by light, e.g. bleaching G02F1/3525Optical damage G02F1/3526using two-photon emission or absorption processes G02F1/3528for producing a supercontinuum G02F1/353Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams G02F1/3532Arrangements of plural nonlinear devices for generating multi-colour light beams, e.g. arrangements of SHG, SFG, OPO devices for generating RGB light beams G02F1/3534Three-wave interaction, e.g. sum-difference frequency generation G02F1/3532 takes precedence G02F1/3536Four-wave interaction G02F1/3538for optical phase conjugation controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation using optical phase conjugation H01S3/10076 G02F1/354Third or higher harmonic generation G02F1/3542Multipass arrangements, i.e. arrangements to make light pass multiple times through the same element, e.g. using an enhancement cavity G02F1/3544Particular phase matching techniques G02F1/3546Active phase matching, e.g. by electro- or thermo-optic tuning G02F1/3548Quasi phase matching [QPM], e.g. using a periodic domain inverted structure G02F1/355characterised by the materials used G02F1/3551Crystals G02F1/3553having the formula MTiOYO4, where M=K, Rb, TI, NH4 or Cs and Y=P or As, e.g. KTP G02F1/3555Glasses G02F1/3556Semiconductor materials, e.g. quantum wells G02F1/3558Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM] G02F1/361Organic materials G02F1/3611containing Nitrogen G02F1/3612Heterocycles having N as heteroatom G02F1/3613containing Sulfur G02F1/3614Heterocycles having S as heteroatom G02F1/3615containing polymers G02F1/3616having the non-linear optical group in the main chain G02F1/3617having the non-linear optical group in a side chain G02F1/3618Langmuir Blodgett Films G02F1/3619Organometallic compounds G02F1/365in an optical waveguide structure G02F1/377, G02F1/395 take precedence G02F1/37for second-harmonic generation G02F1/3532 takes precedence G02F1/372Means for homogenizing the output beam G02F1/374Cherenkov radiation G02F1/377in an optical waveguide structure G02F1/3775with a periodic structure, e.g. domain inversion, for quasi-phase-matching [QPM] G02F1/383 takes precedence G02F1/383of the optical fibre type G02F1/39for parametric generation or amplification of light, infra-red or ultra-violet waves G02F1/392Parametric amplification G02F1/395in optical waveguides G02F1/397Amplification of light by wave mixing involving an interference pattern, e.g. using photorefractive material G02F2/00Demodulating lightTransferring the modulation of modulated lightFrequency-changing of light G02F1/35 takes precedence G02F2/002using optical mixing G02F2/004Transferring the modulation of modulated light, i.e. transferring the information from one optical carrier of a first wavelength to a second optical carrier of a second wavelength, e.g. all-optical wavelength converter G02F2/006All-optical wavelength conversion G02F2/008Opto-electronic wavelength conversion, i.e. involving photo-electric conversion of the first optical carrier G02F2/02Frequency-changing of light, e.g. by quantum counters G02F3/00Optical logic elementsOptical bistable devices G02F3/02Optical bistable devices G02F3/022based on electro-, magneto- or acousto-optical elements G02F3/028 takes precedence G02F3/024based on non-linear elements, e.g. non-linear Fabry-Perot cavity G02F3/028 takes precedence G02F3/026based on laser effects G02F3/028based on self electro-optic effect devices [SEED] G02F7/00Optical analogue/digital converters This group covers only converters based in substantial manner on elements which are provided for in group G02F1/00. G02F2201/00 G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 G02F2201/02fibre G02F2201/04monomode G02F2201/05multimode G02F2201/06integrated waveguide G02F2201/063ridgeribstrip loaded G02F2201/066channelburied G02F2201/07buffer layer G02F2201/08light absorbing layer G02F2201/083infra-red absorbing G02F2201/086UV absorbing G02F2201/12electrode G02F2201/121common or background G02F2201/122having a particular pattern G02F2201/123pixel G02F2201/124interdigital G02F2201/125delta-beta G02F2201/126push-pull G02F2201/127travelling wave G02F2201/128field shaping G02F2201/14asymmetric G02F2201/15periodic G02F2201/16seriestandem G02F2201/17Multi-pass arrangements, i.e. arrangements to pass light a plurality of times through the same element, e.g. by using an enhancement cavity G02F2201/18parallel G02F2201/20delay line G02F2201/205of fibre type G02F2201/30grating G02F2201/302grating coupler G02F2201/305diffraction grating G02F2201/307Reflective grating, i.e. Bragg grating G02F2201/34reflector G02F2201/343cholesteric liquid crystal reflector G02F2201/346distributed (Bragg) reflector G02F2201/36Airflow channels, e.g. constructional arrangements facilitating the flow of air G02F2201/38Anti-reflection arrangements G02F2201/40Arrangements for improving the aperture ratio G02F2201/42Arrangements for providing conduction through an insulating substrate G02F2201/44Arrangements combining different electro-active layers, e.g. electrochromic, liquid crystal or electroluminescent layers G02F2201/46Fixing elements G02F2201/465Snap -fit G02F2201/48Flattening arrangements G02F2201/50Protective arrangements G02F2201/501Blocking layers, e.g. against migration of ions G02F2201/503Arrangements improving the resistance to shock G02F2201/505Arrangements improving the resistance to acoustic resonance like noise G02F2201/506Repairing, e.g. with redundant arrangement against defective part G02F2201/508Pseudo repairing, e.g. a defective part is brought into a condition in which it does not disturb the functioning of the device G02F2201/52RGB geometrical arrangements G02F2201/54Arrangements for reducing warping-twist G02F2201/56Substrates having a particular shape, e.g. non-rectangular G02F2201/58Arrangements comprising a monitoring photodetector G02F2202/00Materials and properties G02F2202/01dipole G02F2202/02organic material G02F2202/021low molecular weight G02F2202/022polymeric G02F2202/023curable G02F2202/025thermocurable G02F2202/026charge transfer complex G02F2202/027Langmuir-Blodgett film G02F2202/028photobleached G02F2202/04dye G02F2202/043pleochroic G02F2202/046fluorescent G02F2202/06dopant G02F2202/07poled G02F2202/08glass transition temperature G02F2202/09inorganic glass G02F2202/10semiconductor G02F2202/101Ga×As and alloy G02F2202/102In×P and alloy G02F2202/103a-Si G02F2202/104poly-Si G02F2202/105single crystal Si G02F2202/106Cd×Se or Cd×Te and alloys G02F2202/107Zn×S or Zn×Se and alloys G02F2202/108quantum wells G02F2202/12photoconductor G02F2202/13photorefractive G02F2202/14photochromic G02F2202/16conductive G02F2202/20LiNbO₃, LiTaO₃ G02F2202/22Antistatic materials or arrangements G02F2202/28Adhesive materials or arrangements G02F2202/30Metamaterials G02F2202/32Photonic crystals G02F2202/34Metal hydrides materials G02F2202/36Micro- or nanomaterials G02F2202/38Sol-gel materials G02F2202/40Materials having a particular birefringence, retardation G02F2202/42Materials having a particular dielectric constant G02F2203/00Function characteristic G02F2203/01transmissive G02F2203/02reflective G02F2203/023total internal reflection G02F2203/026attenuated or frustrated internal reflection G02F2203/03scattering G02F2203/04wavelength independent G02F2203/05wavelength dependent G02F2203/055wavelength filtering G02F2203/06Polarisation independent G02F2203/07Polarisation dependent G02F2203/09transflective G02F2203/10plasmon G02F2203/11involving infrared radiation G02F2203/12spatial light modulator G02F2203/13involving THZ radiation G02F2203/15involving resonance effects, e.g. resonantly enhanced interaction G02F2203/16involving spin polarization effects G02F2203/17involving soliton waves G02F2203/18adaptive optics, e.g. wavefront correction G02F2203/19linearised modulationreduction of harmonic distortions G02F2203/20Intrinsic phase difference, i.e. optical bias, of an optical modulatorMethods for the pre-set thereof G02F2203/21Thermal instability, i.e. DC drift, of an optical modulatorArrangements or methods for the reduction thereof G02F2203/22diffractive G02F2203/24beam steering G02F2203/25Frequency chirping of an optical modulatorArrangements or methods for the pre-set or tuning thereof G02F2203/255Negative chirp G02F2203/26Pulse shapingApparatus or methods therefor G02F2203/28focussing or defocussing G02F2203/30Gray scale G02F2203/34Colour display without the use of colour mosaic filters G02F2203/48Variable attenuator G02F2203/50Phase-only modulation G02F2203/52Optical limiters G02F2203/54Optical pulse train (comb) synthesizer G02F2203/56Frequency comb synthesizer G02F2203/58Multi-wavelength, e.g. operation of the device at a plurality of wavelengths G02F2203/585Add/drop devices G02F2203/60Temperature independent G02F2203/62Switchable arrangements whereby the element being usually not switchable G02F2203/64Normally black display, i.e. the off state being black G02F2203/66Normally white display, i.e. the off state being white G02F2203/68Green display, e.g. recycling, reduction of harmful substances G02F2203/69Arrangements or methods for testing or calibrating a device G02F2203/70Semiconductor optical amplifier [SOA] used in a device covered by G02F G02F2413/00Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates G02F2413/01Number of plates being 1 G02F2413/02Number of plates being 2 G02F2413/03Number of plates being 3 G02F2413/04Number of plates greater than or equal to 4 G02F2413/05Single plate on one side of the LC cell G02F2413/06Two plates on one side of the LC cell G02F2413/07All plates on one side of the LC cell G02F2413/08with a particular optical axis orientation G02F2413/10with refractive index ellipsoid inclined, or tilted, relative to the LC-layer surface O plate G02F2413/105with varying inclination in thickness direction, e.g. hybrid oriented discotic LC G02F2413/12Biaxial compensators G02F2413/13Positive birefingence G02F2413/14Negative birefingence G02F2413/15with twisted orientation, e.g. comprising helically oriented LC-molecules or a plurality of twisted birefringent sublayers