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390 lines
226 KiB
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390 lines
226 KiB
XML
<?xml version="1.0" encoding="UTF-8"?>
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<class-scheme publication-date="2023-02-01" scheme-type="cpc" publication-type="official">
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<classification-item breakdown-code="false" not-allocatable="true" level="5" additional-only="false" sort-key="G03F" definition-exists="true" date-revised="2018-08-01" status="published"><classification-symbol>G03F</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES</text></title-part><title-part><text>MATERIALS THEREFOR</text></title-part><title-part><text>ORIGINALS THEREFOR</text></title-part><title-part><text>APPARATUS SPECIALLY ADAPTED THEREFOR; </text><reference><text>phototypographic composing devices <class-ref scheme="cpc">B41B</class-ref>; photosensitive materials or processes for photographic purposes <class-ref scheme="cpc">G03C</class-ref>; electrophotography, sensitive layers or processes therefor <class-ref scheme="cpc">G03G</class-ref></text></reference></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> In this subclass, the following terms or expressions are used with the meanings indicated : <subnote type="bullet"><note-paragraph>"photosensitive" means not only sensitive to electro- magnetic radiation but also to corpuscular radiation; </note-paragraph><note-paragraph>"photosensitive compositions" covers photosensitive substances, e.g. quinonediazides, and, if applicable, binders or additives; </note-paragraph><note-paragraph>"photosensitive materials" covers the photosensitive compositions, e.g. photoresists, the bases carrying them and, if applicable, auxiliary layers. </note-paragraph></subnote></note-paragraph></note><note type="warning"><note-paragraph warning-type="ipc-not-used">The following IPC groups are not in the CPC scheme. The subject matter for these IPC groups is classified in the following CPC groups: <table><row><entry><class-ref scheme="ipc">G03F3/08</class-ref></entry><entry> covered by </entry><entry><class-ref scheme="cpc">H04N1/46</class-ref></entry></row><row><entry><class-ref scheme="ipc">G03F7/207</class-ref></entry><entry> covered by </entry><entry><class-ref scheme="cpc">G03F7/20</class-ref></entry></row><row><entry><class-ref scheme="ipc">G03F7/23</class-ref></entry><entry> covered by </entry><entry><class-ref scheme="cpc">G03F7/22</class-ref></entry></row><row><entry><class-ref scheme="ipc">G03F9/02</class-ref></entry><entry> covered by </entry><entry><class-ref scheme="cpc">G03F9/00</class-ref></entry></row></table></note-paragraph><note-paragraph>In this subclass non-limiting references (in the sense of paragraph 39 of the Guide to the IPC) may still be displayed in the scheme.</note-paragraph></note></notes-and-warnings>
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<classification-item breakdown-code="false" not-allocatable="true" level="6" additional-only="false" sort-key="G03F1/00" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/00</classification-symbol>
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<classification-item breakdown-code="false" not-allocatable="false" level="7" additional-only="false" sort-key="G03F1/00" definition-exists="true" ipc-concordant="G03F1/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2020-08-01" status="published"><classification-symbol>G03F1/00</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles</text></title-part><title-part><text>Mask blanks or pellicles therefor</text></title-part><title-part><text>Containers specially adapted therefor</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title><notes-and-warnings date-revised="2013-11-05"><note type="note"><note-paragraph><br/> In this group, the first place priority rule is applied, i.e. at each hierarchical level, in the absence of an indication to the contrary, classification is made in the first appropriate place. </note-paragraph></note></notes-and-warnings>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/20" definition-exists="false" ipc-concordant="G03F1/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/20</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/22" definition-exists="false" ipc-concordant="G03F1/22" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/22</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/24" definition-exists="false" ipc-concordant="G03F1/24" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/24</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Reflection masks</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/26" definition-exists="false" ipc-concordant="G03F1/26" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/26</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Phase shift masks [PSM]</text></title-part><title-part><text>PSM blanks</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/28" definition-exists="false" ipc-concordant="G03F1/28" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/28</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>with three or more diverse phases on the same PSM</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/29" definition-exists="false" ipc-concordant="G03F1/29" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/29</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Rim PSM or outrigger PSM</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/30" definition-exists="false" ipc-concordant="G03F1/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/30</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Alternating PSM, e.g. Levenson-Shibuya PSM</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/32" definition-exists="false" ipc-concordant="G03F1/32" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/32</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion,</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/34" definition-exists="false" ipc-concordant="G03F1/34" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/34</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Phase-edge PSM, e.g. chromeless PSM</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/36" definition-exists="false" ipc-concordant="G03F1/36" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/36</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Masks having proximity correction features</text></title-part><title-part><text>Preparation thereof, e.g. optical proximity correction [OPC] design processes</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/38" definition-exists="false" ipc-concordant="G03F1/38" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/38</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Masks having auxiliary features, e.g. special coatings or marks for alignment or testing</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/40" definition-exists="false" ipc-concordant="G03F1/40" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/40</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/42" definition-exists="false" ipc-concordant="G03F1/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F1/42</classification-symbol><class-title date-revised="2017-08-01"><title-part><text>Alignment or registration features, e.g. alignment marks on the mask substrates</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/44" definition-exists="false" ipc-concordant="G03F1/44" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/44</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/46" definition-exists="false" ipc-concordant="G03F1/46" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/46</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Antireflective coatings</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/48" definition-exists="false" ipc-concordant="G03F1/48" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/48</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Protective coatings</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/50" definition-exists="false" ipc-concordant="G03F1/50" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/50</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Mask blanks not covered by <class-ref scheme="cpc">G03F1/20</class-ref> - <class-ref scheme="cpc">G03F1/34</class-ref></text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/52" definition-exists="false" ipc-concordant="G03F1/52" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/52</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Reflectors</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/54" definition-exists="false" ipc-concordant="G03F1/54" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F1/54</classification-symbol><class-title date-revised="2017-08-01"><title-part><text>Absorbers, e.g. of opaque materials</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/56" definition-exists="false" ipc-concordant="G03F1/56" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F1/56</classification-symbol><class-title date-revised="2017-08-01"><title-part><text>Organic absorbers, e.g. of photo-resists</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/58" definition-exists="false" ipc-concordant="G03F1/58" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F1/58</classification-symbol><class-title date-revised="2017-08-01"><title-part><text>having two or more different absorber layers, e.g. stacked multilayer absorbers</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/60" definition-exists="false" ipc-concordant="G03F1/60" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/60</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Substrates</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/62" definition-exists="false" ipc-concordant="G03F1/62" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-01-01" status="published"><classification-symbol>G03F1/62</classification-symbol><class-title date-revised="2017-01-01"><title-part><text>Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/64" definition-exists="false" ipc-concordant="G03F1/64" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/64</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>characterised by the frames, e.g. structure or material, including bonding means therefor</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/66" definition-exists="false" ipc-concordant="G03F1/66" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/66</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Containers specially adapted for masks, mask blanks or pellicles</text></title-part><title-part><text>Preparation thereof</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/68" definition-exists="false" ipc-concordant="G03F1/68" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/68</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Preparation processes not covered by groups <class-ref scheme="cpc">G03F1/20</class-ref> - <class-ref scheme="cpc">G03F1/50</class-ref></text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/70" definition-exists="false" ipc-concordant="G03F1/70" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F1/70</classification-symbol><class-title date-revised="2017-08-01"><title-part><text>Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/72" definition-exists="false" ipc-concordant="G03F1/72" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/72</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Repair or correction of mask defects</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F1/74" definition-exists="false" ipc-concordant="G03F1/74" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/74</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by charged particle beam [CPB], e.g. focused ion beam</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/76" definition-exists="false" ipc-concordant="G03F1/76" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/76</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Patterning of masks by imaging</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F1/78" definition-exists="false" ipc-concordant="G03F1/78" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/78</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by charged particle beam [CPB], e.g. electron beam patterning of masks</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/80" definition-exists="false" ipc-concordant="G03F1/80" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/80</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Etching</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F1/82" definition-exists="false" ipc-concordant="G03F1/82" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/82</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Auxiliary processes, e.g. cleaning or inspecting</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F1/84" definition-exists="false" ipc-concordant="G03F1/84" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/84</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Inspecting</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F1/86" definition-exists="false" ipc-concordant="G03F1/86" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/86</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by charged particle beam [CPB]</text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/88" definition-exists="false" ipc-concordant="G03F1/88" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/88</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>prepared by photographic processes for production of originals simulating relief</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/90" definition-exists="false" ipc-concordant="G03F1/90" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/90</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>prepared by montage processes</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F1/92" definition-exists="false" ipc-concordant="G03F1/92" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F1/92</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>prepared from printing surfaces</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="7" additional-only="false" sort-key="G03F3/00" definition-exists="true" ipc-concordant="G03F3/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/00</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Colour separation</text></title-part><title-part><text>Correction of tonal value </text><reference><text>photographic copying apparatus in general <class-ref scheme="cpc">G03B</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F3/02" definition-exists="false" ipc-concordant="G03F3/02" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/02</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by retouching</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F3/04" definition-exists="false" ipc-concordant="G03F3/04" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/04</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by photographic means</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/06" definition-exists="false" ipc-concordant="G03F3/06" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/06</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by masking</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F3/10" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/10</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Checking the colour or tonal value of separation negatives or positives</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/101" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/101</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Colour or tonal value checking by non-photographic means or by means other than using non-impact printing methods or duplicating or marking methods covered by <class-ref scheme="cpc">B41M5/00</class-ref></text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/102" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/102</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Lamination or delamination method or apparatus for colour proofing systems</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/103" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/103</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using tonable photoresist or photopolymerisable systems</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/105" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/105</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using electro photographic materials</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/106" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/106</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/107" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/107</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using silver halide photosensitive materials</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F3/108" definition-exists="false" ipc-concordant="G03F3/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F3/108</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a non-impact printing method, e.g. ink jet, using duplicating or marking methods covered by <class-ref scheme="cpc">B41M5/00</class-ref>, e.g. by ablation or by thermographic means</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="7" additional-only="false" sort-key="G03F5/00" definition-exists="true" ipc-concordant="G03F5/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/00</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Screening processes</text></title-part><title-part><text>Screens therefor </text><CPC-specific-text><reference><text>plates or light sensitive layers with incorporated screen <class-ref scheme="cpc">G03F7/004</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F5/02" definition-exists="false" ipc-concordant="G03F5/02" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/02</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by projection methods </text><reference><text>cameras <class-ref scheme="cpc">G03B</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/04" definition-exists="false" ipc-concordant="G03F5/04" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/04</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>changing the screen effect</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/06" definition-exists="false" ipc-concordant="G03F5/06" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/06</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>changing the diaphragm effect</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/08" definition-exists="false" ipc-concordant="G03F5/08" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/08</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using line screens</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/10" definition-exists="false" ipc-concordant="G03F5/10" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/10</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using cross-line screens</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/12" definition-exists="false" ipc-concordant="G03F5/12" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/12</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using other screens, e.g. granulated screen</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F5/14" definition-exists="false" ipc-concordant="G03F5/14" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/14</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by contact methods</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/16" definition-exists="false" ipc-concordant="G03F5/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/16</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using grey half-tone screens</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F5/18" definition-exists="false" ipc-concordant="G03F5/18" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/18</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using colour half-tone screens</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F5/20" definition-exists="false" ipc-concordant="G03F5/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/20</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>using screens for gravure printing</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F5/22" definition-exists="false" ipc-concordant="G03F5/22" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-01-01" status="published"><classification-symbol>G03F5/22</classification-symbol><class-title date-revised="2017-01-01"><title-part><text>combining several screens</text></title-part><title-part><text>Elimination of moiré</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F5/24" definition-exists="false" ipc-concordant="G03F5/24" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F5/24</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>by multiple exposure, e.g. combined processes for line photo and screen</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="7" additional-only="false" sort-key="G03F7/00" definition-exists="true" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/00</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces</text></title-part><title-part><text>Materials therefor, e.g. comprising photoresists</text></title-part><title-part><text>Apparatus specially adapted therefor </text><reference><text>using photoresist structures for special production processes, <u>see</u> the relevant places, e.g. <class-ref scheme="cpc">B44C</class-ref>, <class-ref scheme="cpc">H01L</class-ref>, e.g. <class-ref scheme="cpc">H01L21/00</class-ref>, <class-ref scheme="cpc">H05K</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0002" definition-exists="true" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0002</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0005" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0005</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0007" definition-exists="true" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0007</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Filters, e.g. additive colour filters; Components for display devices</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/001" definition-exists="true" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/001</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Phase modulating patterns, e.g. refractive index patterns</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0012" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0012</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0015" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0015</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Production of aperture devices, microporous systems or stamps</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0017" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0017</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for the production of embossing, cutting or similar devices; for the production of casting means</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/002" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/002</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0022" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0022</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Devices or apparatus</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0025" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0025</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by means for coating the developer</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0027" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0027</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by pressure means</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/003" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/003</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by storage means for the light sensitive material, e.g. cartridges</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0032" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0032</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by heat providing or glossing means</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0035" definition-exists="false" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0035</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/0037" definition-exists="true" ipc-concordant="G03F7/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0037</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Production of three-dimensional images</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/004" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/004</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Photosensitive materials </text><reference><text><class-ref scheme="cpc">G03F7/12</class-ref>, <class-ref scheme="cpc">G03F7/14</class-ref> take precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0041" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0041</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>providing an etching agent upon exposure </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence; photolytic halogen compounds <class-ref scheme="cpc">G03F7/0295</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0042" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0042</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0043" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0043</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof </text><reference><text><class-ref scheme="cpc">G03F7/0044</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0044" definition-exists="false" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0044</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>involving an interaction between the metallic and non-metallic component, e.g. photodope systems</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0045" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0045</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0046" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0046</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with perfluoro compounds, e.g. for dry lithography </text><reference><text><class-ref scheme="cpc">G03F7/0048</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0047" definition-exists="true" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0047</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/0048" definition-exists="false" ipc-concordant="G03F7/004" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0048</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/008" definition-exists="true" ipc-concordant="G03F7/008" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/008</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Azides </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0085" definition-exists="false" ipc-concordant="G03F7/008" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0085</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the non-macromolecular additives</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/012" definition-exists="true" ipc-concordant="G03F7/012" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/012</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Macromolecular azides</text></title-part><title-part><text>Macromolecular additives, e.g. binders </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/0085</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0125" definition-exists="false" ipc-concordant="G03F7/012" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0125</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/016" definition-exists="true" ipc-concordant="G03F7/016" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/016</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Diazonium salts or compounds </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0163" definition-exists="false" ipc-concordant="G03F7/016" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0163</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0166" definition-exists="false" ipc-concordant="G03F7/016" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0166</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the non-macromolecular additives</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/021" definition-exists="true" ipc-concordant="G03F7/021" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/021</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Macromolecular diazonium compounds</text></title-part><title-part><text>Macromolecular additives, e.g. binders </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/0166</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0212" definition-exists="false" ipc-concordant="G03F7/021" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0212</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/0215" definition-exists="false" ipc-concordant="G03F7/021" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0215</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/0217" definition-exists="false" ipc-concordant="G03F7/021" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0217</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Polyurethanes; Epoxy resins</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/022" definition-exists="true" ipc-concordant="G03F7/022" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/022</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Quinonediazides </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0223" definition-exists="false" ipc-concordant="G03F7/022" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2015-10-01" status="published"><classification-symbol>G03F7/0223</classification-symbol><class-title date-revised="2015-10-01"><title-part><CPC-specific-text><text>Iminoquinonediazides; Para-quinonediazides</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0226" definition-exists="false" ipc-concordant="G03F7/022" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0226</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the non-macromolecular additives</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/023" definition-exists="true" ipc-concordant="G03F7/023" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/023</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Macromolecular quinonediazides</text></title-part><title-part><text>Macromolecular additives, e.g. binders </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/0226</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0233" definition-exists="false" ipc-concordant="G03F7/023" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0233</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/0236" definition-exists="true" ipc-concordant="G03F7/023" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0236</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/025" definition-exists="true" ipc-concordant="G03F7/025" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/025</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/027" definition-exists="true" ipc-concordant="G03F7/027" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/027</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0275" definition-exists="false" ipc-concordant="G03F7/027" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0275</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with dithiol or polysulfide compounds</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/028" definition-exists="false" ipc-concordant="G03F7/028" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/028</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>with photosensitivity-increasing substances, e.g. photoinitiators</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0285" definition-exists="false" ipc-concordant="G03F7/028" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0285</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Silver salts, e.g. a latent silver salt image</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/029" definition-exists="true" ipc-concordant="G03F7/029" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/029</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Inorganic compounds</text></title-part><title-part><text>Onium compounds</text></title-part><title-part><text>Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/0295" definition-exists="false" ipc-concordant="G03F7/029" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0295</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Photolytic halogen compounds</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/031" definition-exists="true" ipc-concordant="G03F7/031" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/031</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Organic compounds not covered by group <class-ref scheme="cpc">G03F7/029</class-ref></text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/032" definition-exists="false" ipc-concordant="G03F7/032" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/032</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>with binders</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0325" definition-exists="false" ipc-concordant="G03F7/032" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0325</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>the binders being polysaccharides, e.g. cellulose</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/033" definition-exists="true" ipc-concordant="G03F7/033" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/033</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/035" definition-exists="true" ipc-concordant="G03F7/035" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2014-02-04" status="published"><classification-symbol>G03F7/035</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>the binders being polyurethanes</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/037" definition-exists="true" ipc-concordant="G03F7/037" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2014-02-04" status="published"><classification-symbol>G03F7/037</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>the binders being polyamides or polyimides</text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/038" definition-exists="true" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/038</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Macromolecular compounds which are rendered insoluble or differentially wettable </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence; macromolecular azides <class-ref scheme="cpc">G03F7/012</class-ref>; macromolecular diazonium compounds <class-ref scheme="cpc">G03F7/021</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0381" definition-exists="false" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0381</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a combination of a phenolic resin and a polyoxyethylene resin</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0382" definition-exists="false" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0382</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>the macromolecular compound being present in a chemically amplified negative photoresist composition</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0384" definition-exists="false" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0384</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with ethylenic or acetylenic bands in the main chain of the photopolymer</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0385" definition-exists="true" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2020-01-01" status="published"><classification-symbol>G03F7/0385</classification-symbol><class-title date-revised="2020-01-01"><title-part><CPC-specific-text><text>using epoxidised novolak resin</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0387" definition-exists="true" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0387</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Polyamides or polyimides</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0388" definition-exists="false" ipc-concordant="G03F7/038" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0388</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with ethylenic or acetylenic bands in the side chains of the photopolymer</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/039" definition-exists="true" ipc-concordant="G03F7/039" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/039</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Macromolecular compounds which are photodegradable, e.g. positive electron resists </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence; macromolecular quinonediazides <class-ref scheme="cpc">G03F7/023</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0392" definition-exists="false" ipc-concordant="G03F7/039" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0392</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>the macromolecular compound being present in a chemically amplified positive photoresist composition</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0395" definition-exists="false" ipc-concordant="G03F7/039" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0395</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>the macromolecular compound having a backbone with alicyclic moieties</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0397" definition-exists="false" ipc-concordant="G03F7/039" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2019-05-01" status="published"><classification-symbol>G03F7/0397</classification-symbol><class-title date-revised="2019-05-01"><title-part><CPC-specific-text><text>the macromolecular compound having an alicyclic moiety in a side chain</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/04" definition-exists="true" ipc-concordant="G03F7/04" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/04</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Chromates </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/06" definition-exists="true" ipc-concordant="G03F7/06" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/06</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Silver salts </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/063" definition-exists="false" ipc-concordant="G03F7/06" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/063</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/066" definition-exists="false" ipc-concordant="G03F7/06" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/066</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Organic derivatives of bivalent sulfur, e.g. onium derivatives</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/07" definition-exists="true" ipc-concordant="G03F7/07" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/07</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>used for diffusion transfer </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/063</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/075" definition-exists="false" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/075</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Silicon-containing compounds</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0751" definition-exists="false" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0751</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>used as adhesion-promoting additives or as means to improve adhesion</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0752" definition-exists="false" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0752</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>in non photosensitive layers or as additives, e.g. for dry lithography</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0754" definition-exists="true" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0754</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-macromolecular compounds containing silicon-to-silicon bonds </text><reference><text><class-ref scheme="cpc">G03F7/0752</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0755" definition-exists="true" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0755</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds </text><reference><text><class-ref scheme="cpc">G03F7/0752</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/0757" definition-exists="true" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0757</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Macromolecular compounds containing Si-O, Si-C or Si-N bonds </text><reference><text><class-ref scheme="cpc">G03F7/0752</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0758" definition-exists="false" ipc-concordant="G03F7/075" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0758</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with silicon- containing groups in the side chains</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/085" definition-exists="true" ipc-concordant="G03F7/085" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/085</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/09" definition-exists="true" ipc-concordant="G03F7/09" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/09</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>characterised by structural details, e.g. supports, auxiliary layers </text><reference><text>supports for printing plates in general <class-ref scheme="cpc">B41N</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/091" definition-exists="true" ipc-concordant="G03F7/09" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/091</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/092" definition-exists="false" ipc-concordant="G03F7/09" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/092</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/093" definition-exists="false" ipc-concordant="G03F7/09" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/093</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by antistatic means, e.g. for charge depletion</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/094" definition-exists="false" ipc-concordant="G03F7/09" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/094</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multilayer resist systems, e.g. planarising layers</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/095" definition-exists="true" ipc-concordant="G03F7/095" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/095</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>having more than one photosensitive layer </text><reference><text><class-ref scheme="cpc">G03F7/075</class-ref> takes precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0952" definition-exists="false" ipc-concordant="G03F7/095" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0952</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0955" definition-exists="false" ipc-concordant="G03F7/095" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0955</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/0957" definition-exists="false" ipc-concordant="G03F7/095" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/0957</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with sensitive layers on both sides of the substrate</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/105" definition-exists="false" ipc-concordant="G03F7/105" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/105</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>having substances, e.g. indicators, for forming visible images</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/11" definition-exists="true" ipc-concordant="G03F7/11" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-05-01" status="published"><classification-symbol>G03F7/11</classification-symbol><class-title date-revised="2016-05-01"><title-part><text>having cover layers or intermediate layers, e.g. subbing layers </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/091</class-ref> - <class-ref scheme="cpc">G03F7/093</class-ref>, <class-ref scheme="cpc">B41N3/03</class-ref> take precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/115" definition-exists="false" ipc-concordant="G03F7/115" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/115</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing</text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/12" definition-exists="false" ipc-concordant="G03F7/12" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/12</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Production of screen printing forms or similar printing forms, e.g. stencils</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/14" definition-exists="false" ipc-concordant="G03F7/14" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/14</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Production of collotype printing forms</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/16" definition-exists="true" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/16</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Coating processes</text></title-part><title-part><text>Apparatus therefor </text><reference><text>applying coatings to base materials in general <class-ref scheme="cpc">B05</class-ref>; applying photosensitive compositions to base for photographic purposes <class-ref scheme="cpc">G03C1/74</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/161" definition-exists="false" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/161</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a previously coated surface, e.g. by stamping or by transfer lamination</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/162" definition-exists="false" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/162</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Coating on a rotating support, e.g. using a whirler or a spinner</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/164" definition-exists="false" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/164</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using electric, electrostatic or magnetic means; powder coating</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/165" definition-exists="false" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/165</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Monolayers, e.g. Langmuir-Blodgett</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/167" definition-exists="true" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/167</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>from the gas phase, by plasma deposition </text><reference><text><class-ref scheme="cpc">G03F7/2035</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/168" definition-exists="true" ipc-concordant="G03F7/16" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/168</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Finishing the coated layer, e.g. drying, baking, soaking</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/18" definition-exists="false" ipc-concordant="G03F7/18" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/18</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Coating curved surfaces</text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/20" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/20</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Exposure</text></title-part><title-part><text>Apparatus therefor </text><reference><text>photographic printing apparatus for making copies <class-ref scheme="cpc">G03B27/00</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2002" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2002</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2004" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2004</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2006" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2006</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using coherent light; using polarised light</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2008" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2008</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/201" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/201</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2012" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2012</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2014" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2014</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2016" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2016</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/2018" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2018</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/202" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/202</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Masking pattern being obtained by thermal means, e.g. laser ablation</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2022" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2022</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2024" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2024</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>of the already developed image</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2026" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2026</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for the removal of unwanted material, e.g. image or background correction</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2028" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2028</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>of an edge bead on wafers</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/203" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/203</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2032" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2032</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Simultaneous exposure of the front side and the backside</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2035" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2035</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>simultaneous coating and exposure; using a belt mask, e.g. endless</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2037" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2037</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2039" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2039</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>X-ray radiation</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2041" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2041</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>in the presence of a fluid, e.g. immersion; using fluid cooling means</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2043" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2043</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2045" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2045</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using originals with apertures, e.g. stencil exposure masks</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2047" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2047</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Exposure with radiation other than visible light or UV light, e.g. shadow printing, proximity printing</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2049" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2049</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a cantilever</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/2051" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2051</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source </text><reference><text><class-ref scheme="cpc">G03F7/70</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2053" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2053</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a laser </text><reference><text>ablative removal <class-ref scheme="cpc">B41C</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2055" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2055</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for the production of printing plates; Exposure of liquid photohardening compositions</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2057" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2057</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using an addressed light valve, e.g. a liquid crystal device</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/2059" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2059</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using a scanning corpuscular radiation beam, e.g. an electron beam</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2061" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2061</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Electron scattering (proximity) correction or prevention methods</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2063" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2063</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for the production of exposure masks or reticles</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/2065" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/2065</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using corpuscular radiation other than electron beams</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="true" not-allocatable="false" level="9" additional-only="true" sort-key="G03F7/2067" definition-exists="true" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F2007/2067</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Apparatus for microlithography</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/213" definition-exists="true" ipc-concordant="G03F7/213" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/213</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Exposing with the same light pattern different positions of the same surface at the same time </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/70</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/22" definition-exists="true" ipc-concordant="G03F7/22" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/22</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Exposing sequentially with the same light pattern different positions of the same surface </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/70</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/24" definition-exists="true" ipc-concordant="G03F7/24" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/24</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Curved surfaces </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/70</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/26" definition-exists="true" ipc-concordant="G03F7/26" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-05-01" status="published"><classification-symbol>G03F7/26</classification-symbol><class-title date-revised="2016-05-01"><title-part><text>Processing photosensitive materials</text></title-part><title-part><text>Apparatus therefor </text><reference><text><class-ref scheme="cpc">G03F7/12</class-ref> - <class-ref scheme="cpc">G03F7/24</class-ref> take precedence</text></reference></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/265" definition-exists="true" ipc-concordant="G03F7/26" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/265</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/28" definition-exists="true" ipc-concordant="G03F7/28" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/28</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>for obtaining powder images </text><reference><text><class-ref scheme="cpc">G03F3/10</class-ref> takes precedence</text></reference></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/30" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/30</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Imagewise removal using liquid means</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3007" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3007</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>combined with electrical means, e.g. force fields</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3014" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3014</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>combined with ultrasonic means</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3021" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3021</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>from a wafer supported on a rotating chuck</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/3028" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3028</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by means for on-wafer monitoring of the processing</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3035" definition-exists="true" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3035</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>from printing plates fixed on a cylinder or on a curved surface; from printing cylinders</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3042" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3042</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>from printing plates transported horizontally through the processing stations</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/305" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/305</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the brushing or rubbing means</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/3057" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3057</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the processing units other than the developing unit, e.g. washing units</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/3064" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3064</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>characterised by the transport means or means for confining the different units, e.g. to avoid the overflow</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/3071" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3071</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Process control means, e.g. for replenishing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/3078" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3078</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Processing different kinds of plates, e.g. negative and positive plates, in the same machine</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3085" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3085</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/3092" definition-exists="false" ipc-concordant="G03F7/30" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/3092</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Recovery of material; Waste processing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/32" definition-exists="true" ipc-concordant="G03F7/32" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/32</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Liquid compositions therefor, e.g. developers</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/322" definition-exists="false" ipc-concordant="G03F7/32" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/322</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Aqueous alkaline compositions</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/325" definition-exists="false" ipc-concordant="G03F7/32" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/325</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-aqueous compositions</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/327" definition-exists="false" ipc-concordant="G03F7/32" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/327</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/34" definition-exists="false" ipc-concordant="G03F7/34" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/34</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Imagewise removal by selective transfer, e.g. peeling away</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/343" definition-exists="false" ipc-concordant="G03F7/34" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/343</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Lamination or delamination methods or apparatus for photolitographic photosensitive material</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/346" definition-exists="false" ipc-concordant="G03F7/34" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/346</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/36" definition-exists="true" ipc-concordant="G03F7/36" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-05-01" status="published"><classification-symbol>G03F7/36</classification-symbol><class-title date-revised="2016-05-01"><title-part><text>Imagewise removal not covered by groups <class-ref scheme="cpc">G03F7/30</class-ref> - <class-ref scheme="cpc">G03F7/34</class-ref>, e.g. using gas streams, using plasma</text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/38" definition-exists="true" ipc-concordant="G03F7/38" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/38</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Treatment before imagewise removal, e.g. prebaking </text><CPC-specific-text><reference><text><class-ref scheme="cpc">G03F7/265</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/40" definition-exists="true" ipc-concordant="G03F7/40" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/40</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Treatment after imagewise removal, e.g. baking</text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/405" definition-exists="true" ipc-concordant="G03F7/40" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/405</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Treatment with inorganic or organometallic reagents after imagewise removal</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/42" definition-exists="true" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/42</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Stripping or agents therefor</text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> Stripping involving the use of a combination of means, e.g. plasma and radiation, is classified in group <class-ref scheme="cpc">G03F7/42</class-ref> only </note-paragraph></note></notes-and-warnings>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/421" definition-exists="false" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/421</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using biological means only, e.g. enzymes</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/422" definition-exists="true" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/422</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using liquids only </text><reference><text><class-ref scheme="cpc">G03F7/421</class-ref> takes precedence</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/423" definition-exists="true" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/423</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/425" definition-exists="false" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/425</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/426" definition-exists="true" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/426</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/427" definition-exists="true" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/427</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using plasma means only</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/428" definition-exists="false" ipc-concordant="G03F7/42" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/428</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using ultrasonic means only</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F7/70" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Exposure apparatus for microlithography</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70008" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70008</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Production of exposure light, i.e. light sources</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70016" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70016</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>by discharge lamps </text><reference><text>discharge lamps <u>per se</u> <class-ref scheme="cpc">H01J61/00</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70025" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70025</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>by lasers </text><reference><text>lasers <u>per se</u> <class-ref scheme="cpc">H01S3/00</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70033" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70033</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>by plasma EUV sources </text><reference><text>plasma EUV sources <u>per se</u> <class-ref scheme="cpc">H05G2/00</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70041" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70041</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>by pulsed sources</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7005" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7005</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>by multiple sources </text><reference><text>addressable array sources specially adapted to produce patterns <class-ref scheme="cpc">G03F7/70391</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70058" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70058</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mask illumination systems</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70066" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70066</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Size and form of the illuminated area in the mask plane, e.g. REMA</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70075" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70075</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Homogenization of illumination intensity in the mask plane, by using an integrator, e.g. fly's eye lenses, facet mirrors, glass rods, by using a diffusive optical element or by beam deflection</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70083" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70083</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-homogeneous intensity distribution in the mask plane</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70091" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70091</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA]</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/701" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/701</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Off-axis setting using an aperture</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70108" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70108</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Off-axis setting using a light-guiding element</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70116" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70116</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Off-axis setting using a programmable means, e.g. LCD or DMD</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70125" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70125</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Use of illumination settings tailored to particular mask patterns </text><reference><text>details of setting means <class-ref scheme="cpc">G03F7/70091</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70133" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70133</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Measurement of illumination distribution, in pupil plane or field plane</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70141" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70141</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Illumination system adjustment, alignment during assembly of illumination system </text><reference><text>alignment of mask with workpiece <class-ref scheme="cpc">G03F9/70</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7015" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7015</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Details of optical elements</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70158" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70158</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Diffractive optical elements</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70166" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70166</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Capillary or channel elements, e.g. nested EUV mirrors</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70175" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70175</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Lamphouse reflector arrangements, i.e. collecting light from solid angle upstream of the light source</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70183" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70183</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Zoom systems</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70191" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70191</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> Wavelength or polarisation control is further classified in groups <class-ref scheme="cpc">G03F7/70566</class-ref>, <class-ref scheme="cpc">G03F7/70575</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/702" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/702</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Reflective illumination, i.e. reflective optical elements other than folding mirrors</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70208" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70208</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multiple illumination paths, e.g. radiation distribution device, multiplexer, demultiplexer for single or multiple projection systems</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70216" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70216</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Systems for imaging mask onto workpiece</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70225" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70225</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Catadioptric systems, i.e. documents describing optical design aspect details</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph><br/> Catadioptric systems are further classified in group <class-ref scheme="cpc">G02B17/0892</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70233" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70233</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical aspects of catoptric systems</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph><br/> Further aspects of catoptric systems are classified in group <class-ref scheme="cpc">G02B17/06</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70241" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70241</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical aspects of refractive systems</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> Further aspects of refractive systems are classified in group <class-ref scheme="cpc">G02B13/143</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7025" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7025</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Size or form of projection system aperture</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70258" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70258</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Projection system adjustment, alignment during assembly of projection system </text><reference><text>alignment of mask with workpiece <class-ref scheme="cpc">G03F9/70</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70266" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70266</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Adaptive optics, e.g. deformable optical elements for wavefront control</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70275" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70275</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70283" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2020-08-01" status="published"><classification-symbol>G03F7/70283</classification-symbol><class-title date-revised="2020-08-01"><title-part><CPC-specific-text><text>Masks or their effects on the imaging process, e.g. Fourier masks, greyscale masks, holographic masks, phase shift masks, phasemasks, lenticular masks, multiple masks, tilted masks, tandem masks </text><reference><text>masks <u>per se</u> <class-ref scheme="cpc">G03F1/00</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70291" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70291</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Addressable masks</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/703" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/703</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-planar pattern area or non-planar masks</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70308" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-08-01" status="published"><classification-symbol>G03F7/70308</classification-symbol><class-title date-revised="2016-08-01"><title-part><CPC-specific-text><text>Optical correction elements, filters and phase plates for manipulating, e.g. intensity, wavelength, polarization, phase, image shift </text><reference><text>filters <u>per se</u> <class-ref scheme="cpc">G02B5/20</class-ref></text></reference></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph><br/> Wavelength or polarisation control is further classified in groups <class-ref scheme="cpc">G03F7/70566</class-ref>, <class-ref scheme="cpc">G03F7/70575</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70316" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70316</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Details of optical elements, e.g. of Bragg reflectors or diffractive optical elements</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> Particular optical materials are further classified in group <class-ref scheme="cpc">G03F7/70958</class-ref>; </note-paragraph><note-paragraph>Multilayer reflectors for X-ray or EUV lithography are further classified in group <class-ref scheme="cpc">G21K1/062</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70325" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70325</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70333" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70333</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Focus drilling, e.g. FLEX</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70341" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70341</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Immersion </text><reference><text>chemical composition of immersion liquids <class-ref scheme="cpc">G03F7/2041</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7035" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7035</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Proximity or contact printer</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70358" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70358</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70366" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70366</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Rotary scanning</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70375" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70375</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70383" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70383</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams </text><reference><text>"maskless" lithography using a programmable mask <class-ref scheme="cpc">G03F7/70291</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70391" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70391</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays </text><reference><text>array sources for exposure apparatus comprising a mask <class-ref scheme="cpc">G03F7/7005</class-ref>; illumination setting using programmable means in exposure apparatus comprising a mask <class-ref scheme="cpc">G03F7/70116</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/704" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/704</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Scanned exposure beam, e.g. raster-, rotary- and vector scanning </text><reference><text>mask projection exposure involving relative movement of patterned beam and workpiece during imaging <class-ref scheme="cpc">G03F7/70358</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70408" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70408</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Interferometric lithography; Holographic lithography; Self-imaging lithography</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70416" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2017-08-01" status="published"><classification-symbol>G03F7/70416</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Stereolithography, 3D printing, rapid prototyping</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph><CPC-specific-note>Apparatus for photolithographical production of three dimensional images are further classified in group <class-ref scheme="cpc">G03F7/0037</class-ref> and group <class-ref scheme="cpc">B29C64/00</class-ref></CPC-specific-note></note-paragraph></note></notes-and-warnings></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70425" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70425</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70433" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2020-08-01" status="published"><classification-symbol>G03F7/70433</classification-symbol><class-title date-revised="2020-08-01"><title-part><CPC-specific-text><text>Layout for increasing efficiency, for compensating imaging errors, e.g. layout of exposure fields,; Use of mask features for increasing efficiency, for compensating imaging errors </text><reference><text>circuit design <u>per se</u> <class-ref scheme="cpc">G06F30/30</class-ref>; designing or making of mask <class-ref scheme="cpc">G03F1/00</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70441" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70441</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical proximity correction</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7045" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7045</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Hybrid exposure, i.e. combining different types of exposure, e.g. projection, proximity, direct write, interferometric, uv, x-ray, particle beam </text><reference><text>constructional details <class-ref scheme="cpc">G03F7/70991</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70458" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70458</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mix-and-match, i.e. multiple exposures of the same area using similar types of exposure, e.g. UV exposure</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70466" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70466</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Multiple exposures, e.g. combination of fine and coarse exposures, double patterning, multiple exposures for printing a single feature, mix-and-match </text><reference><text>stitching <class-ref scheme="cpc">G03F7/70475</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70475" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70475</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70483" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70483</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Information management, control, testing, and wafer monitoring, e.g. pattern monitoring </text><reference><text>detection arrangements <class-ref scheme="cpc">G03F7/7085</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70491" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70491</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Information management and control, including software</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/705" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/705</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70508" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70508</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Data handling, in all parts of the microlithographic apparatus, e.g. addressable masks</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70516" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70516</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Calibration of components of the microlithographic apparatus, e.g. light sources, addressable mask, detectors</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70525" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70525</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Controlling normal operating mode, e.g. matching different apparatus, remote control, prediction of failure</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70533" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70533</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework, rework flow</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70541" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70541</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Tagging, i.e. hardware or software tagging of features or components</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7055" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7055</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70558" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70558</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Dose control, i.e. achievement of a desired dose </text><reference><text>determination of the required dose <class-ref scheme="cpc">G03F7/70625</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70566" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70566</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Polarisation control</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70575" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70575</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength, matching of optical components to wavelength</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70583" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70583</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Speckle reduction, e.g. coherence control, amplitude/wavefront splitting</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70591" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70591</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Testing optical components </text><reference><text>testing of optical mirrors <class-ref scheme="cpc">G01M11/005</class-ref>; testing of lenses <class-ref scheme="cpc">G01M11/02</class-ref>; stray light transmission <class-ref scheme="cpc">G03F7/70941</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/706" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/706</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Aberration measurement </text><reference><text>aberration measurement in general <class-ref scheme="cpc">G01M11/0242</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70608" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70608</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Wafer resist monitoring, e.g. measuring thickness, reflectivity, effects of immersion liquid on resist</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70616" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70616</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane </text><reference><text>optical metrology tools <u>per se</u> <class-ref scheme="cpc">G01B11/02</class-ref> and <class-ref scheme="cpc">G01B9/04</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70625" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70625</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Pattern dimensions, e.g. line width, profile, sidewall angle, edge roughness</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70633" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70633</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Overlay </text><reference><text>alignment between mask and wafer prior to exposure <class-ref scheme="cpc">G03F9/70</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70641" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70641</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Focus </text><reference><text>focus measurement prior to exposure <class-ref scheme="cpc">G03F9/7026</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/7065" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7065</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Defect inspection </text><reference><text>defect inspection apparatus <u>per se</u> <class-ref scheme="cpc">G06T7/0004</class-ref>, <class-ref scheme="cpc">G01N21/956</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70658" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70658</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Electrical</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70666" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2020-08-01" status="published"><classification-symbol>G03F7/70666</classification-symbol><class-title date-revised="2020-08-01"><title-part><CPC-specific-text><text>using aerial image </text><reference><text>aerial image measurement tools for mask inspection <class-ref scheme="cpc">G03F1/68</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70675" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70675</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using latent image</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70683" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70683</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>using process control mark, i.e. specific mark designs</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/70691" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70691</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Handling of masks or wafers</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/707" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/707</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Chucks, e.g. chucking or un-chucking operations </text><reference><text>chucks for workpiece processing tools <class-ref scheme="cpc">H01L21/683</class-ref> or <class-ref scheme="cpc">H01L21/687</class-ref> depending on the type of chucking</text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70708" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70708</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>being electrostatic; Electrostatically deformable vacuum chucks </text><reference><text>electrostatic chucks for workpiece processing tools <class-ref scheme="cpc">H01L21/6831</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70716" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70716</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Stages </text><reference><text>stages for workpiece processing tools <class-ref scheme="cpc">H01L21/682</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70725" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70725</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>control</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70733" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70733</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70741" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70741</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Handling masks outside exposure position, e.g. reticle libraries</text></CPC-specific-text></title-part></class-title><notes-and-warnings date-revised="2013-01-01"><note type="note"><note-paragraph> Protective means, e.g. containers, for masks, blanks or pellicles, are further classified in group <class-ref scheme="cpc">G03F1/66</class-ref></note-paragraph></note></notes-and-warnings></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/7075" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7075</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Handling workpieces outside exposure position, e.g. SMIF box</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70758" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70758</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Drive means, e.g. actuator, motor </text><reference><text>lens or mirror actuators <class-ref scheme="cpc">G03F7/70825</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70766" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70766</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Reaction force control means, e.g. countermass</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70775" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70775</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Position control </text><reference><text>interferometers <u>per se</u> <class-ref scheme="cpc">G01B9/02</class-ref>; encoders <u>per se</u> <class-ref scheme="cpc">G01D5/00</class-ref>; alignment of mask with workpiece <class-ref scheme="cpc">G03F9/70</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70783" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70783</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Stress or warp of chucks, mask or workpiece, e.g. to compensate for imaging error</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70791" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70791</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Large workpieces, e.g. in the shape of web or polygon</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F7/708" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/708</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Construction of apparatus, e.g. environment, hygiene aspects or materials</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70808" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70808</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus </text><reference><text>load-lock chambers for workpiece processors in general <class-ref scheme="cpc">H01L21/67201</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70816" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70816</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Bearings </text><reference><text>fluid bearings <u>per se</u> <class-ref scheme="cpc">F16C32/06</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70825" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70825</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mounting of individual elements, e.g. mounts, holders or supports </text><reference><text>mounts or supports for projection- and illumination system and stages on base-plate or ground <class-ref scheme="cpc">G03F7/70833</class-ref>; workpiece and mask holders <class-ref scheme="cpc">G03F7/707</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70833" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70833</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground </text><reference><text>mounting of individual elements of said systems <class-ref scheme="cpc">G03F7/70825</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70841" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70841</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Constructional issues related to vacuum environment</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7085" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7085</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70858" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70858</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Environment aspects, e.g. pressure of beam-path gas, temperature </text><reference><text>pollution aspects <class-ref scheme="cpc">G03F7/70916</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70866" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70866</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>of mask or workpiece</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/70875" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70875</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Temperature</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70883" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70883</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>of optical system</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/70891" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70891</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Temperature</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/709" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/709</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Vibration, e.g. vibration detection, compensation, suppression</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70908" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70908</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70916" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70916</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70925" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70925</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Cleaning, i.e. actively freeing apparatus from pollutants</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70933" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70933</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Purge</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70941" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70941</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/7095" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/7095</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F7/70958" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70958</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical materials and coatings, e.g. with particular transmittance, reflectance </text><reference><text>details of optical elements <class-ref scheme="cpc">G03F7/70316</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="12" additional-only="false" sort-key="G03F7/70966" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70966</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Birefringence</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70975" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70975</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Assembly, maintenance, transport and storage of apparatus</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70983" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F7/70983</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Optical system protection, e.g. pellicles or removable covers for protection of mask</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F7/70991" definition-exists="false" ipc-concordant="G03F7/20" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-08-01" status="published"><classification-symbol>G03F7/70991</classification-symbol><class-title date-revised="2016-08-01"><title-part><CPC-specific-text><text>Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus, shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate, utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids, vacuum </text><reference><text>apparatus for processing a workpiece in a plurality of work-stations including at least one lithography chamber <class-ref scheme="cpc">H01L21/67225</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="7" additional-only="false" sort-key="G03F9/00" definition-exists="true" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/00</classification-symbol><class-title date-revised="2013-01-01"><title-part><text>Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically </text><reference><text><class-ref scheme="cpc">G03F7/22</class-ref> takes precedence; preparation of photographic masks <class-ref scheme="cpc">G03F1/00</class-ref>; within photographic printing apparatus for making copies <class-ref scheme="cpc">G03B27/00</class-ref></text></reference></title-part></class-title>
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<classification-item breakdown-code="true" not-allocatable="false" level="8" additional-only="true" sort-key="G03F9/005" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F2009/005</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for microlithography</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="8" additional-only="false" sort-key="G03F9/70" definition-exists="true" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/70</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>for microlithography </text><reference><text>measuring printed patterns for monitoring overlay <class-ref scheme="cpc">G03F7/70633</class-ref> or focus <class-ref scheme="cpc">G03F7/70641</class-ref>; projection system adjustment <class-ref scheme="cpc">G03F7/70258</class-ref>; position control <class-ref scheme="cpc">G03F7/70775</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7003" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7003</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment type or strategy, e.g. leveling, global alignment</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7007" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7007</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment other than original with workpiece</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7011" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7011</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7015" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7015</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7019" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7019</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Calibration</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7023" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7023</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Aligning or positioning in direction perpendicular to substrate surface</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7026" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7026</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Focusing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/703" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/703</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Gap setting, e.g. in proximity printer</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7034" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7034</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Leveling</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7038" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7038</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment for proximity or contact printer </text><reference><text>proximity or contact printers <u>per se</u> <class-ref scheme="cpc">G03F7/7035</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7042" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7042</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting </text><reference><text>non-exposure lithographic processes <u>per se</u> <class-ref scheme="cpc">G03F7/0002</class-ref></text></reference></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7046" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7046</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Strategy, e.g. mark, sensor or wavelength selection</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7049" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7049</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Technique, e.g. interferometric</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7053" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7053</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves</text></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7057" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7057</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Gas flow, e.g. for focusing, leveling or gap setting</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="11" additional-only="false" sort-key="G03F9/7061" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7061</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7065" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7065</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7069" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7069</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment mark illumination, e.g. darkfield, dual focus</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7073" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2015-07-01" status="published"><classification-symbol>G03F9/7073</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment marks and their environment </text><reference><text>marks specific to masks <class-ref scheme="cpc">G03F1/42</class-ref>; marks specific to molds or stamps <class-ref scheme="cpc">G03F7/0002</class-ref>; overlay marks <class-ref scheme="cpc">G03F7/70633</class-ref>; marks applied to semiconductor devices <class-ref scheme="cpc">H01L23/544</class-ref></text></reference></CPC-specific-text></title-part></class-title>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7076" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7076</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mark details, e.g. phase grating mark, temporary mark</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/708" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/708</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Mark formation</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="10" additional-only="false" sort-key="G03F9/7084" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2016-08-01" status="published"><classification-symbol>G03F9/7084</classification-symbol><class-title date-revised="2016-08-01"><title-part><CPC-specific-text><text>Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels</text></CPC-specific-text></title-part></class-title></classification-item></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7088" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7088</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7092" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7092</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Signal processing</text></CPC-specific-text></title-part></class-title></classification-item>
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<classification-item breakdown-code="false" not-allocatable="false" level="9" additional-only="false" sort-key="G03F9/7096" definition-exists="false" ipc-concordant="G03F9/00" c-set-base-allowed="false" c-set-subsequent-allowed="true" date-revised="2013-01-01" status="published"><classification-symbol>G03F9/7096</classification-symbol><class-title date-revised="2013-01-01"><title-part><CPC-specific-text><text>Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus</text></CPC-specific-text></title-part></class-title></classification-item></classification-item></classification-item></classification-item></classification-item></class-scheme> |