C23CCOATING METALLIC MATERIALCOATING MATERIAL WITH METALLIC MATERIALSURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTIONCOATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04In this subclass, an operation is considered as pre-treatment or after-treatment when it is specially adapted for, but quite distinct from, the coating process concerned and constitutes an independent operation. If an operation results in the formation of a permanent sub- or upper layer, it is not considered as pre-treatment or after-treatment and is classified as a multi-coating process.The following IPC groups are not in the CPC scheme. The subject matter for these IPC groups is classified in the following CPC groups: C23C14/36 - C23C14/44 covered by C23C14/34 - C23C14/358 C23C2/00Coating by applying the coating material in the molten state C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shapeApparatus thereforGroup C23C2/00 is impacted by reclassification into groups C23C2/325, C23C2/50 - C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/003ApparatusGroup C23C2/003 is impacted by reclassification into groups C23C2/0032 - C23C2/004, C23C2/325, C23C2/50 - C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/0032specially adapted for batch coating of substrateGroups C23C2/0032 and C23C2/00322 are incomplete pending reclassification of documents from groups C23C2/003, C23C2/006 and C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/00322Details of mechanisms for immersing or removing substrate from molten liquid bath, e.g. basket or lifting mechanism C23C2/0034Details related to elements immersed in bathGroups C23C2/0034 - C23C2/00348 are incomplete pending reclassification of documents from groups C23C2/003, C23C2/006 and C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/00342Moving elements, e.g. pumps or mixers C23C2/00344Means for moving substrates, e.g. immersed rollers or immersed bearings C23C2/00348Fixed work supports or guides C23C2/0035Means for continuously moving substrate through, into or out of the bath C23C2/00344 takes precedenceGroup C23C2/0035 is incomplete pending reclassification of documents from groups C23C2/003, C23C2/006 and C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/0036CruciblesGroups C23C2/0036 - C23C2/00362 are incomplete pending reclassification of documents from groups C23C2/003, C23C2/006 and C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/00361characterised by structures including means for immersing or extracting the substrate through confining wall area C23C2/00362Details related to seals, e.g. magnetic means C23C2/0038characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping processGroups C23C2/0038 and C23C2/004 are incomplete pending reclassification of documents from groups C23C2/003, C23C2/006 and C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/004Snouts C23C2/006Pattern or selective depositsGroup C23C2/006 is impacted by reclassification into groups C23C2/0032, C23C2/00322, C23C2/0034, C23C2/00342, C23C2/00344, C23C2/00348, C23C2/0035, C23C2/0036, C23C2/00361, C23C2/00362, C23C2/0038, C23C2/004, C23C2/0062, C23C2/0064, C23C2/50, C23C2/51, C23C2/52, C23C2/521, C23C2/522, C23C2/523, C23C2/524, C23C2/5245, C23C2/525, C23C2/526, C23C2/54, C23C2/542 and C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/0062without pre-treatment of the material to be coated, e.g. using masking elements such as casings, shields, fixtures or blocking elementsGroup C23C2/0062 is incomplete pending reclassification of documents from group C23C2/006.
Groups C23C2/006 and C23C2/0062 should be considered in order to perform a complete search. C23C2/0064using masking layersGroup C23C2/0064 is incomplete pending reclassification of documents from group C23C2/006.
Groups C23C2/0064 and C23C2/006 should be considered in order to perform a complete search. C23C2/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas C23C2/30 takes precedenceGroup C23C2/02 is impacted by reclassification into groups C23C2/022, C23C2/0222, C23C2/0224, C23C2/024, C23C2/026, C23C2/0032 - C23C2/004, C23C2/325 and C23C2/50 - C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/022by heatingGroups C23C2/022 - C23C2/0224 are incomplete pending reclassification of documents from group C23C2/02.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/0222in a reactive atmosphere, e.g. oxidising or reducing atmosphere C23C2/024 takes precedence C23C2/0224Two or more thermal pretreatments C23C2/024by cleaning or etchingGroup C23C2/024 is incomplete pending reclassification of documents from group C23C2/02.
Groups C23C2/02 and C23C2/024 should be considered in order to perform a complete search. C23C2/026Deposition of sublayers, e.g. adhesion layers or pre-applied alloying elements or corrosion protectionGroup C23C2/026 is incomplete pending reclassification of documents from group C23C2/02.
Groups C23C2/02 and C23C2/026 should be considered in order to perform a complete search. C23C2/04characterised by the coating material C23C2/06Zinc or cadmium or alloys based thereon C23C2/08Tin or alloys based thereon C23C2/10Lead or alloys based thereon C23C2/12Aluminium or alloys based thereon C23C2/14Removing excess of molten coatingsControlling or regulating the coating thicknessGroup C23C2/14 is impacted by reclassification into groups C23C2/50 - C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/16using fluids under pressure, e.g. air knives C23C2/18Removing excess of molten coatings from elongated material C23C2/185Tubes; Wires C23C2/20StripsPlates C23C2/22by rubbing, e.g. using knives , e.g. rubbing solids C23C2/24using magnetic or electric fields C23C2/26After-treatment C23C2/14 takes precedenceGroup C23C2/26 is impacted by reclassification into groups C23C2/261, C23C2/325 and C23C2/50 - C23C2/544.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/261in a gas atmosphere, e.g. inert or reducing atmosphereGroup C23C2/261 is incomplete pending reclassification of documents from groups C23C2/26, C23C2/265, C23C2/28 and C23C2/285.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/265by applying solid particles to the molten coatingGroup C23C2/265 is impacted by reclassification into group C23C2/261.
Groups C23C2/265 and C23C2/261 should be considered in order to perform a complete search. C23C2/28Thermal after-treatment, e.g. treatment in oil bathGroup C23C2/28 is impacted by reclassification into groups C23C2/261 and C23C2/29.
Groups C23C2/28, C23C2/261 and C23C2/29 should be considered in order to perform a complete search. C23C2/285for remelting the coatingGroup C23C2/285 is impacted by reclassification into group C23C2/261.
Groups C23C2/285 and C23C2/261 should be considered in order to perform a complete search. C23C2/29Cooling or quenchingGroup C23C2/29 is incomplete pending reclassification of documents from group C23C2/28.
Groups C23C2/28 and C23C2/29 should be considered in order to perform a complete search. C23C2/30Fluxes or coverings on molten baths C23C2/22 takes precedence C23C2/32using vibratory energy applied to the bath or substrate C23C2/14 takes precedence C23C2/325Processes or devices for cleaning the bathGroup C23C2/325 is incomplete pending reclassification of documents from groups C23C2/00, C23C2/003, C23C2/02 and C23C2/26.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/34characterised by the shape of the material to be treated C23C2/14 takes precedence C23C2/36Elongated material C23C2/38WiresTubes C23C2/385Tubes of specific length C23C2/40PlatesStrips C23C2/405Plates of specific length C23C2/50Controlling or regulating the coating processes C23C2/14 takes precedenceGroups C23C2/50 - C23C2/544 are incomplete pending reclassification of documents from groups C23C2/00, C23C2/003, C23C2/006, C23C2/02, C23C2/14 and C23C2/26.
All groups listed in this Warning should be considered in order to perform a complete search. C23C2/51Computer-controlled implementation C23C2/52with means for measuring or sensing C23C2/521Composition of the bath C23C2/522Temperature of the bath C23C2/523Bath level or amount C23C2/524Position of the substrate C23C2/5245for reducing vibrations of the substrate C23C2/525Speed of the substrate C23C2/526for visually inspecting the surface quality of the substrate C23C2/54of the mixing or stirring the bath C23C2/542using static devices separate from the substrate, e.g. a fixed plate C23C2/544using moving mixing devices separate from the substrate, e.g. an impeller of blade C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge build-up welding B23K, e.g. B23K5/18, B23K9/04 C23C4/01Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated C23C4/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas C23C4/04characterised by the coating material C23C4/06Metallic material C23C4/067containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic C23C4/073containing MCrAl or MCrAlY alloys, where M is nickel, cobalt or iron, with or without non-metal elements C23C4/08containing only metal elements C23C4/073 takes precedence C23C4/10Oxides, borides, carbides, nitrides or silicidesMixtures thereof C23C4/11Oxides C23C4/12characterised by the method of spraying C23C4/123Spraying molten metal C23C4/126Detonation spraying C23C4/129Flame spraying C23C4/131Wire arc spraying C23C4/134Plasma spraying C23C4/137Spraying in vacuum or in an inert atmosphere C23C4/14for coating elongate material C23C4/16WiresTubes C23C4/18After-treatment C23C4/185Separation of the coating from the substrate C23C6/00Coating by casting molten material on the substrate C23C8/00Solid state diffusion into metallic material surfaces C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces diffusion of silicon C23C10/00Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals C23C14/00 takes precedence C23C8/02Pretreatment of the material to be coated C23C8/04 takes precedence C23C8/04Treatment of selected surface areas, e.g. using masks C23C8/06using gases C23C8/36 takes precedence C23C8/08only one element being applied C23C8/10Oxidising C23C8/12using elemental oxygen or ozone C23C8/14Oxidising of ferrous surfaces C23C8/16using oxygen-containing compounds, e.g. water, carbon dioxide C23C8/18Oxidising of ferrous surfaces C23C8/20Carburising C23C8/22of ferrous surfaces C23C8/24Nitriding C23C8/26of ferrous surfaces C23C8/28more than one element being applied in one step C23C8/30Carbo-nitriding C23C8/32of ferrous surfaces C23C8/34more than one element being applied in more than one step C23C8/36using ionised gases, e.g. ionitriding C23C8/38Treatment of ferrous surfaces C23C8/40using liquids, e.g. salt baths, liquid suspensions C23C8/42only one element being applied C23C8/44Carburising C23C8/46of ferrous surfaces C23C8/48Nitriding C23C8/50of ferrous surfaces C23C8/52more than one element being applied in one step C23C8/54Carbo-nitriding C23C8/56of ferrous surfaces C23C8/58more than one element being applied in more than one step C23C8/60using solids, e.g. powders, pastes using liquid suspensions of solids C23C8/40 C23C8/62only one element being applied C23C8/64Carburising C23C8/66of ferrous surfaces C23C8/68Boronising C23C8/70of ferrous surfaces C23C8/72more than one element being applied in one step C23C8/74Carbo-nitriding C23C8/76of ferrous surfaces C23C8/78more than one element being applied in more than one step C23C8/80After-treatment C23C10/00Solid state diffusion of only metal elements or silicon into metallic material surfaces C23C10/02Pretreatment of the material to be coated C23C10/04 takes precedence C23C10/04Diffusion into selected surface areas, e.g. using masks C23C10/06using gases C23C10/08only one element being diffused C23C10/10Chromising C23C10/12of ferrous surfaces C23C10/14more than one element being diffused in one step C23C10/16more than one element being diffused in more than one step C23C10/18using liquids, e.g. salt baths, liquid suspensions C23C10/20only one element being diffused C23C10/22Metal melt containing the element to be diffused C23C10/24Salt bath containing the element to be diffused C23C10/26more than one element being diffused C23C10/28using solids, e.g. powders, pastes C23C10/30using a layer of powder or paste on the surface using liquid suspensions of solids C23C10/18 C23C10/32Chromising C23C10/34Embedding in a powder mixture, i.e. pack cementation C23C10/36only one element being diffused C23C10/38Chromising C23C10/40of ferrous surfaces C23C10/42in the presence of volatile transport additives, e.g. halogenated substances C23C10/44Siliconising C23C10/46of ferrous surfaces C23C10/48Aluminising C23C10/50of ferrous surfaces C23C10/52more than one element being diffused in one step C23C10/54Diffusion of at least chromium C23C10/56and at least aluminium C23C10/58more than one element being diffused in more than one step C23C10/60After-treatment C23C12/00Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces C23C12/02Diffusion in one step C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material C23C14/0005Separation of the coating from the substrate C23C14/001Coating on a liquid substrate C23C14/0015characterized by the colour of the layer C23C14/0021Reactive sputtering or evaporation C23C14/0026Activation or excitation of reactive gases outside the coating chamber C23C14/0031Bombardment of substrates by reactive ion beams C23C14/0036Reactive sputtering C23C14/0042Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements C23C14/0047Activation or excitation of reactive gases outside the coating chamber C23C14/0052Bombardment of substrates by reactive ion beams C23C14/0057using reactive gases other than O₂, H₂O, N₂, NH₃ or CH₄ C23C14/0063characterised by means for introducing or removing gases C23C14/0068characterised by means for confinement of gases or sputtered material, e.g. screens, baffles C23C14/0073by exposing the substrates to reactive gases intermittently C23C14/0078by moving the substrates between spatially separate sputtering and reaction stations C23C14/0084Producing gradient compositions C23C14/0089in metallic mode C23C14/0094in transition mode C23C14/02Pretreatment of the material to be coated C23C14/04 takes precedence C23C14/021Cleaning or etching treatments C23C14/022by means of bombardment with energetic particles or radiation C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence C23C14/025Metallic sublayers C23C14/027Graded interfaces C23C14/028Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing C23C14/04Coating on selected surface areas, e.g. using masks C23C14/042using masks C23C14/044using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient C23C14/046Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates C23C14/048using irradiation by energy or particles C23C14/06characterised by the coating material C23C14/0021 , C23C14/04 take precedence C23C14/0605Carbon C23C14/0611Diamond C23C14/0617AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi C23C14/0623Sulfides, selenides or tellurides C23C14/0629of zinc, cadmium or mercury C23C14/0635Carbides C23C14/0641Nitrides C23C14/0617 takes precedence C23C14/0647Boron nitride C23C14/0652Silicon nitride C23C14/0658Carbon nitride C23C14/0664Carbonitrides C23C14/067Borides C23C14/0676Oxynitrides C23C14/0682Silicides C23C14/0688Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides C23C14/0694Halides C23C14/08Oxides C23C14/10 takes precedence C23C14/081of aluminium, magnesium or beryllium C23C14/082of alkaline earth metals C23C14/083of refractory metals or yttrium C23C14/085of iron group metals C23C14/086of zinc, germanium, cadmium, indium, tin, thallium or bismuth C23C14/087of copper or solid solutions thereof C23C14/088of the type ABO₃ with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal C23C14/10Glass or silica C23C14/12Organic material C23C14/14Metallic material, boron or silicon C23C14/16on metallic substrates or on substrates of boron or silicon C23C14/165by cathodic sputtering C23C14/18on other inorganic substrates C23C14/185by cathodic sputtering C23C14/20on organic substrates C23C14/205by cathodic sputtering C23C14/22characterised by the process of coating C23C14/221Ion beam deposition C23C14/46, C23C14/48 take precedence C23C14/223specially adapted for coating particles C23C14/225Oblique incidence of vaporised material on substrate C23C14/226in order to form films with columnar structure C23C14/228Gas flow assisted PVD deposition C23C14/24Vacuum evaporation C23C14/243Crucibles for source material C23C14/28, C23C14/30 take precedence C23C14/246Replenishment of source material C23C14/26by resistance or inductive heating of the source C23C14/28by wave energy or particle radiation C23C14/32 - C23C14/48 take precedence C23C14/30by electron bombardment C23C14/32by explosionby evaporation and subsequent ionisation of the vapours , e.g. ion-platingC23C14/34 - C23C14/48 take precedence C23C14/325Electric arc evaporation C23C14/34Sputtering C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy C23C14/3421using heated targets C23C14/3428using liquid targets C23C14/3435Applying energy to the substrate during sputtering C23C14/3442using an ion beam C23C14/345using substrate bias C23C14/3457using other particles than noble gas ions C23C14/0036, C23C14/46 take precedence C23C14/3464using more than one target C23C14/56 takes precedence C23C14/3471Introduction of auxiliary energy into the plasma C23C14/3478using electrons, e.g. triode sputtering C23C14/3485using pulsed power to the target C23C14/3492Variation of parameters during sputtering C23C14/35by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence C23C14/351using a magnetic field in close vicinity to the substrate C23C14/352using more than one target C23C14/56 takes precedence C23C14/354Introduction of auxiliary energy into the plasma C23C14/355using electrons, e.g. triode sputtering C23C14/357Microwaves, e.g. electron cyclotron resonance enhanced sputtering C23C14/358Inductive energy C23C14/46by ion beam produced by an external ion source C23C14/48Ion implantation C23C14/50Substrate holders C23C14/505for rotation of the substrates C23C14/52Means for observation of the coating process C23C14/54Controlling or regulating the coating process C23C14/541Heating or cooling of the substrates C23C14/542Controlling the film thickness or evaporation rate C23C14/543using measurement on the vapor source C23C14/544using measurement in the gas phase C23C14/545using measurement on deposited material C23C14/546using crystal oscillators C23C14/547using optical methods C23C14/548Controlling the composition C23C14/56Apparatus specially adapted for continuous coatingArrangements for maintaining the vacuum, e.g. vacuum locks C23C14/562for coating elongated substrates C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases C23C14/566using a load-lock chamber C23C14/568Transferring the substrates through a series of coating stations C23C14/562 takes precedence C23C14/58After-treatment C23C14/5806Thermal treatment C23C14/5813using lasers C23C14/582using electron bombardment C23C14/5826Treatment with charged particles C23C14/582 takes precedence C23C14/5833Ion beam bombardment C23C14/584Non-reactive treatment C23C14/5846Reactive treatment C23C14/5853Oxidation C23C14/586Nitriding C23C14/5866Treatment with sulfur, selenium or tellurium C23C14/5873Removal of material C23C14/588by mechanical treatment C23C14/5886Mechanical treatment involving removal of material C23C14/588 C23C14/5893Mixing of deposited material C23C16/00Chemical deposition or plating by decompositionContact plating C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes reactive sputtering or vacuum evaporation C23C14/00 C23C16/003Coating on a liquid substrate C23C16/006characterized by the colour of the layer C23C16/01on temporary substrates, e.g. substrates subsequently removed by etching C23C16/02Pretreatment of the material to be coated C23C16/04 takes precedence C23C16/0209by heating C23C16/0218in a reactive atmosphere C23C16/0227 takes precedence C23C16/0227by cleaning or etching C23C16/0236by etching with a reactive gas C23C16/0245by etching with a plasma C23C16/0254Physical treatment to alter the texture of the surface, e.g. scratching or polishing C23C16/0263Irradiation with laser or particle beam C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating C23C16/0281of metallic sub-layers C23C16/029 takes precedence C23C16/029Graded interfaces C23C16/04Coating on selected surface areas, e.g. using masks C23C16/042using masks C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates C23C16/047using irradiation by energy or particles C23C16/06characterised by the deposition of metallic material C23C16/08from metal halides C23C16/10Deposition of chromium only C23C16/12Deposition of aluminium only C23C16/14Deposition of only one other metal element C23C16/16from metal carbonyl compounds C23C16/18from metallo-organic compounds C23C16/20Deposition of aluminium only C23C16/22characterised by the deposition of inorganic material, other than metallic material C23C16/24Deposition of silicon only C23C16/26Deposition of carbon only C23C16/27Diamond only C23C16/271using hot filaments C23C16/272using DC, AC or RF discharges C23C16/274using microwave discharges C23C16/275using combustion torches C23C16/276using plasma jets C23C16/277using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets C23C16/278doping or introduction of a secondary phase in the diamond C23C16/279control of diamond crystallography C23C16/28Deposition of only one other non-metal element C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides C23C16/301AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi C23C16/303Nitrides C23C16/305Sulfides, selenides, or tellurides C23C16/306AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te C23C16/308Oxynitrides C23C16/32Carbides C23C16/325Silicon carbide C23C16/34Nitrides C23C16/303 takes precedence C23C16/342Boron nitride C23C16/345Silicon nitride C23C16/347Carbon nitride C23C16/36Carbonitrides C23C16/38Borides C23C16/40Oxides C23C16/401containing silicon C23C16/402Silicon dioxide C23C16/403of aluminium, magnesium or beryllium C23C16/404of alkaline earth metals C23C16/405of refractory metals or yttrium C23C16/406of iron group metals C23C16/407of zinc, germanium, cadmium, indium, tin, thallium or bismuth C23C16/408of copper or solid solutions thereof C23C16/409of the type ABO₃ with A representing alkali, alkaline earth metal or lead and B representing a refractory metal, nickel, scandium or a lanthanide C23C16/42Silicides C23C16/44characterised by the method of coating C23C16/04 takes precedence C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber C23C16/4402Reduction of impurities in the source gas C23C16/4404Coatings or surface treatment on the inside of the reaction chamber or on parts thereof C23C16/4405Cleaning of reactor or parts inside the reactor by using reactive gases C23C16/4407Cleaning of reactor or reactor parts by using wet or mechanical methods C23C16/4408by purging residual gases from the reaction chamber or gas lines C23C16/4409characterised by sealing means C23C16/4411Cooling of the reaction chamber walls C23C16/45572 takes precedence C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps C23C16/4414Electrochemical vapour deposition [EVD] C23C16/4415Acoustic wave CVD C23C16/4417Methods specially adapted for coating powder C23C16/4418Methods for making free-standing articles C23C16/01 takes precedence C23C16/442using fluidised bed process C23C16/448characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials C23C16/4481by evaporation using carrier gas in contact with the source material C23C16/4486 takes precedence C23C16/4482by bubbling of carrier gas through liquid source material C23C16/4483using a porous body C23C16/4485by evaporation without using carrier gas in contact with the source material C23C16/4486 takes precedence C23C16/4486by producing an aerosol and subsequent evaporation of the droplets or particles C23C16/4487by using a condenser C23C16/4488by in situ generation of reactive gas by chemical or electrochemical reaction C23C16/452by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species C23C16/453passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD C23C16/513 takes precedence; for flame or plasma spraying of coating material in the molten state C23C4/00 C23C16/455characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber C23C16/45502Flow conditions in reaction chamber C23C16/45504Laminar flow C23C16/45506Turbulent flow C23C16/45508Radial flow C23C16/4551Jet streams C23C16/45512Premixing before introduction in the reaction chamber C23C16/45514Mixing in close vicinity to the substrate C23C16/45517Confinement of gases to vicinity of substrate C23C16/45519Inert gas curtains C23C16/45521the gas, other than thermal contact gas, being introduced the rear of the substrate to flow around its periphery C23C16/45523Pulsed gas flow or change of composition over time C23C16/45525Atomic layer deposition [ALD] C23C16/45527characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations C23C16/45529specially adapted for making a layer stack of alternating different compositions or gradient compositions C23C16/45531specially adapted for making ternary or higher compositions C23C16/45534Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers C23C16/45536Use of plasma, radiation or electromagnetic fields C23C16/45538Plasma being used continuously during the ALD cycle C23C16/4554Plasma being used non-continuously in between ALD reactions C23C16/56 takes precedence C23C16/45542Plasma being used non-continuously during the ALD reactions C23C16/45544characterized by the apparatus C23C16/45546specially adapted for a substrate stack in the ALD reactor C23C16/45548having arrangements for gas injection at different locations of the reactor for each ALD half-reaction C23C16/45551for relative movement of the substrate and the gas injectors or half-reaction reactor compartments C23C16/45553characterized by the use of precursors specially adapted for ALD C23C16/45555applied in non-semiconductor technology C23C16/45557Pulsed pressure or control pressure C23C16/45559Diffusion of reactive gas to substrate C23C16/45561Gas plumbing upstream of the reaction chamber C23C16/45563Gas nozzles C23C16/45565Shower nozzles C23C16/45568Porous nozzles C23C16/4557Heated nozzles C23C16/45572Cooled nozzles C23C16/45574Nozzles for more than one gas C23C16/45576Coaxial inlets for each gas C23C16/45578Elongated nozzles, tubes with holes C23C16/4558Perforated rings C23C16/45582Expansion of gas before it reaches the substrate C23C16/45585Compression of gas before it reaches the substrate C23C16/45587Mechanical means for changing the gas flow C23C16/45589Movable means, e.g. fans C23C16/45591Fixed means, e.g. wings, baffles C23C16/45593Recirculation of reactive gases C23C16/45595Atmospheric CVD gas inlets with no enclosed reaction chamber C23C16/45597Reactive back side gas C23C16/458characterised by the method used for supporting substrates in the reaction chamber C23C16/4581characterised by material of construction or surface finish of the means for supporting the substrate C23C16/4582Rigid and flat substrates, e.g. plates or discs C23C16/4581 takes precedence C23C16/4583the substrate being supported substantially horizontally C23C16/4584the substrate being rotated C23C16/4585Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds C23C16/4586Elements in the interior of the support, e.g. electrodes, heating or cooling devices C23C16/4587the substrate being supported substantially vertically C23C16/4588the substrate being rotated C23C16/46characterised by the method used for heating the substrate C23C16/48, C23C16/50 take precedence C23C16/463Cooling of the substrate C23C16/466using thermal contact gas C23C16/48by irradiation, e.g. photolysis, radiolysis, particle radiation C23C16/481by radiant heating of the substrate C23C16/482using incoherent light, UV to IR, e.g. lamps C23C16/483using coherent light, UV to IR, e.g. lasers C23C16/484using X-ray radiation C23C16/485using synchrotron radiation C23C16/486using ion beam radiation C23C16/487using electron radiation C23C16/488Protection of windows for introduction of radiation into the coating chamber C23C16/50using electric discharges generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34 C23C16/503using dc or ac discharges C23C16/505using radio frequency discharges C23C16/507using external electrodes, e.g. in tunnel type reactors C23C16/509using internal electrodes C23C16/5093Coaxial electrodes C23C16/5096Flat-bed apparatus C23C16/511using microwave discharges C23C16/513using plasma jets C23C16/515using pulsed discharges C23C16/517using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515 C23C16/52Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence C23C16/54Apparatus specially adapted for continuous coating C23C16/545for coating elongated substrates C23C16/56After-treatment C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coatingContact platingThis groups covers also suspensions containing reactive liquids and non-reactive solid particles. C23C18/02by thermal decomposition C23C18/04Pretreatment of the material to be coated C23C18/06 takes precedence C23C18/06Coating on selected surface areas, e.g. using masks C23C18/08characterised by the deposition of metallic material C23C18/10Deposition of aluminium only C23C18/12characterised by the deposition of inorganic material other than metallic material C23C18/1204inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds C23C18/1208Oxides, e.g. ceramics C23C18/1212Zeolites, glasses C23C18/1216Metal oxides C23C18/1212 takes precedence C23C18/122Inorganic polymers, e.g. silanes, polysilazanes, polysiloxanes C23C18/1225Deposition of multilayers of inorganic material C23C18/1229Composition of the substrate C23C18/1233Organic substrates C23C18/1237Composite substrates, e.g. laminated, premixed C23C18/1241Metallic substrates C23C18/1245Inorganic substrates other than metallic C23C18/125Process of deposition of the inorganic material C23C18/1254Sol or sol-gel processing C23C18/1258Spray pyrolysis C23C18/1262involving particles, e.g. carbon nanotubes [CNT], flakes C23C18/1266Particles formed in situ C23C18/127Preformed particles C23C18/1275performed under inert atmosphere C23C18/1279performed under reactive atmosphere, e.g. oxidising or reducing atmospheres C23C18/1283Control of temperature, e.g. gradual temperature increase, modulation of temperature C23C18/1287with flow inducing means, e.g. ultrasonic C23C18/1291by heating of the substrate C23C18/1295with after-treatment of the deposited inorganic material C23C18/14Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources C23C18/143Radiation by light, e.g. photolysis or pyrolysis C23C18/145Radiation by charged particles, e.g. electron beams or ion irradiation C23C18/16by reduction or substitution, e.g. electroless plating C23C18/54 takes precedence C23C18/1601Process or apparatus C23C18/1603coating on selected surface areas C23C18/1605by masking C23C18/1607by direct patterning C23C18/1608from pretreatment step, i.e. selective pre-treatment C23C18/161from plating step, e.g. inkjet C23C18/1612through irradiation means C23C18/1614plating on one side C23C18/1616interior or inner surface C23C18/1617Purification and regeneration of coating baths C23C18/1619Apparatus for electroless plating C23C18/1621Protection of inner surfaces of the apparatus C23C18/1623through electrochemical processes C23C18/1625through chemical processes C23C18/1626through mechanical processes C23C18/1628Specific elements or parts of the apparatus C23C18/163Supporting devices for articles to be coated C23C18/1632Features specific for the apparatus, e.g. layout of cells and of its equipment, multiple cells C23C18/1633Process of electroless plating C23C18/1635Composition of the substrate C23C18/1637metallic substrate C23C18/1639Substrates other than metallic, e.g. inorganic or organic or non-conductive C23C18/1641Organic substrates, e.g. resin, plastic C23C18/1642semiconductor semiconductor H01L21/288 C23C18/1644porous substrates C23C18/1646Characteristics of the product obtained C23C18/1648Porous product C23C18/165Multilayered product layered product B32B C23C18/1651Two or more layers only obtained by electroless plating C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating C23C18/1655Process features C23C18/1657Electroless forming, i.e. substrate removed or destroyed at the end of the process C23C18/1658with two steps starting with metal deposition followed by addition of reducing agent C23C18/166with two steps starting with addition of reducing agent followed by metal deposition C23C18/1662Use of incorporated material in the solution or dispersion, e.g. particles, whiskers, wires C23C18/1664with additional means during the plating process C23C18/1666Ultrasonics C23C18/1667Radiant energy, e.g. laser C23C18/1669Agitation, e.g. air introduction C23C18/1671Electric field C23C18/1673Magnetic field C23C18/1675Process conditions C23C18/1676Heating of the solution C23C18/1678Heating of the substrate C23C18/168Control of temperature, e.g. temperature of bath, substrate C23C18/1682Control of atmosphere C23C18/1683Control of electrolyte composition, e.g. measurement, adjustment regeneration of bath C23C18/1617 C23C18/1685with supercritical condition, e.g. chemical fluid deposition C23C18/1687with ionic liquid C23C18/1689After-treatment C23C18/1691Cooling, e g. forced or controlled cooling C23C18/1692Heat-treatment C23C18/1694Sequential heat treatment C23C18/1696Control of atmosphere C23C18/1698Control of temperature C23C18/18Pretreatment of the material to be coated C23C18/1803of metallic material surfaces or of a non-specific material surfaces C23C18/1806by mechanical pretreatment, e.g. grinding, sanding C23C18/181by formation of electrostatic charges, e.g. tribofriction C23C18/1813by radiant energy C23C18/1817Heat C23C18/182Radiation, e.g. UV, laser C23C18/1824by chemical pretreatment C23C18/1827only one step pretreatment C23C18/1831Use of metal, e.g. activation, sensitisation with noble metals C23C18/1834Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers C23C18/1837Multistep pretreatment C23C18/1841with use of metal first C23C18/1844with use of organic or inorganic compounds other than metals, first C23C18/1848by electrochemical pretreatment C23C18/1851of surfaces of non-metallic or semiconducting in organic material C23C18/1855by mechanical pretreatment, e.g. grinding, sanding the groups C23C18/1855 - C23C18/1896 are not complete, pending reorganisation. See also C23C18/18 C23C18/1858by formation of electrostatic charges, e.g. tribofriction C23C18/1862by radiant energy C23C18/1865Heat C23C18/1868Radiation, e.g. UV, laser C23C18/1872by chemical pretreatment C23C18/1875only one step pretreatment C23C18/1879Use of metal, e.g. activation, sensitisation with noble metals C23C18/1882Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers C23C18/1886Multistep pretreatment C23C18/1889with use of metal first C23C18/1893with use of organic or inorganic compounds other than metals, first C23C18/1896by electrochemical pretreatment C23C18/20of organic surfaces, e.g. resins C23C18/2006by other methods than those of C23C18/22 - C23C18/30 C23C18/2013by mechanical pretreatment, e.g. grinding, sanding the groups C23C18/2013 - C23C18/2093 are not complete, pending reorganisation. See also C23C18/2006 C23C18/202by formation of electrostatic charges, e.g. tribofriction C23C18/2026by radiant energy C23C18/2033Heat C23C18/204Radiation, e.g. UV, laser C23C18/2046by chemical pretreatment C23C18/2053only one step pretreatment C23C18/206Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals sensitising with tin C23C18/285, sensitising with noble metals C23C18/30 C23C18/2066Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers C23C18/2073Multistep pretreatment C23C18/208with use of metal first C23C18/2086with use of organic or inorganic compounds other than metals, first C23C18/2093by electrochemical pretreatment C23C18/22Roughening, e.g. by etching C23C18/24using acid aqueous solutions C23C18/26using organic liquids C23C18/28Sensitising or activating C23C18/285Sensitising or activating with tin based compound or composition C23C18/30Activating or accelerating or sensitising with palladium or other noble metal C23C18/31Coating with metals C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron C23C18/50 takes precedence C23C18/34using reducing agents C23C18/36using hypophosphites C23C18/38Coating with copper C23C18/40using reducing agents C23C18/405Formaldehyde C23C18/42Coating with noble metals C23C18/44using reducing agents C23C18/48Coating with alloys C23C18/50with alloys based on iron, cobalt or nickel C23C18/52using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50 C23C18/54Contact plating, i.e. electroless electrochemical plating C23C20/00Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coatingThis group covers also suspensions containing non-reactive liquids and reactive solid particles. C23C20/02Coating with metallic material C23C20/04with metals C23C20/06Coating with inorganic material, other than metallic material C23C20/08with compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive medium C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metalsThis group covers also suspensions containing reactive liquids and non-reactive solid particles. In groups C23C22/02 - C23C22/86, in the absence of an indication to the contrary, classification is made in the last appropriate place. Rejuvenating of the bath is classified in the appropriate place for the specific bath composition. C23C22/02using non-aqueous solutions C23C22/03containing phosphorus compounds C23C22/04containing hexavalent chromium compounds C23C22/05using aqueous solutions C23C22/06using aqueous acidic solutions with pH less than 6 C23C22/07containing phosphates C23C22/08Orthophosphates C23C22/10containing oxidants C23C22/12containing zinc cations C23C22/13containing also nitrate or nitrite anions C23C22/14containing also chlorate anions C23C22/16containing also peroxy-compounds C23C22/17containing also organic acids C23C22/18containing manganese cations C23C22/182containing also zinc cations C23C22/184containing also nickel cations C23C22/186containing also copper cations C23C22/188containing also magnesium cations C23C22/20containing aluminium cations C23C22/22containing alkaline earth metal cations C23C22/23Condensed phosphates C23C22/24containing hexavalent chromium compounds C23C22/26containing also organic compounds C23C22/27Acids C23C22/28Macromolecular compounds C23C22/30containing also trivalent chromium C23C22/32containing also pulverulent metals C23C22/33containing also phosphates C23C22/34containing fluorides or complex fluorides C23C22/36containing also phosphates C23C22/361containing titanium, zirconium or hafnium compounds C23C22/362containing also zinc cations C23C22/364containing also manganese cations C23C22/365containing also zinc and nickel cations C23C22/367containing alkaline earth metal cations C23C22/368containing magnesium cations C23C22/37containing also hexavalent chromium compounds C23C22/38containing also phosphates C23C22/40containing molybdates, tungstates or vanadates C23C22/42containing also phosphates C23C22/43containing also hexavalent chromium compounds C23C22/44containing also fluorides or complex fluorides C23C22/46containing oxalates C23C22/47containing also phosphates C23C22/48not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates C23C22/50Treatment of iron or alloys based thereon C23C22/52Treatment of copper or alloys based thereon C23C22/53Treatment of zinc or alloys based thereon C23C22/54Treatment of refractory metals or alloys based thereon C23C22/56Treatment of aluminium or alloys based thereon C23C22/57Treatment of magnesium or alloys based thereon C23C22/58Treatment of other metallic material C23C22/60using alkaline aqueous solutions with pH greater than 8 C23C22/62Treatment of iron or alloys based thereon C23C22/63Treatment of copper or alloys based thereon C23C22/64Treatment of refractory metals or alloys based thereon C23C22/66Treatment of aluminium or alloys based thereon C23C22/67with solutions containing hexavalent chromium C23C22/68using aqueous solutions with pH between 6 and 8 C23C22/70using melts C23C22/72Treatment of iron or alloys based thereon C23C22/73characterised by the process C23C22/74for obtaining burned-in conversion coatings C23C22/76Applying the liquid by spraying C23C22/77Controlling or regulating of the coating process C23C22/78Pretreatment of the material to be coated C23C22/80with solutions containing titanium or zirconium compounds C23C22/82After-treatment C23C22/83Chemical after-treatment C23C22/84Dyeing C23C22/86Regeneration of coating baths C23C24/00Coating starting from inorganic powder spraying of the coating material in molten state C23C4/00; solid state diffusion C23C8/00 - C23C12/00 C23C24/02by application of pressure only C23C24/04Impact or kinetic deposition of particles C23C24/045by trembling using impacting inert media C23C24/06Compressing powdered coating material, e.g. by milling C23C24/08by application of heat or pressure and heat C23C24/04 takes precedence C23C24/082without intermediate formation of a liquid in the layer C23C24/085Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides C23C24/087Coating with metal alloys or metal elements only C23C24/10with intermediate formation of a liquid phase in the layer C23C24/103Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides C23C24/106Coating with metal alloys or metal elements only C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00 C23C26/02applying molten material to the substrate C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D C23C28/02only coatings only including layers of metallic material C23C28/021including at least one metal alloy layer C23C28/022with at least one MCrAlX layer C23C28/023only coatings of metal elements only C23C28/025with at least one zinc-based layer C23C28/026including at least one amorphous metallic material layer C23C28/027including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC. C23C28/028Including graded layers in composition or in physical properties, e.g. density, porosity, grain size C23C28/04only coatings of inorganic non-metallic material C23C28/042including a refractory ceramic layer, e.g. refractory metal oxides, ZrO₂, rare earth oxides C23C28/044coatings specially adapted for cutting tools or wear applications C23C28/046with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not C23C28/048with layers graded in composition or physical properties C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer C23C28/32including at least one pure metallic layer C23C28/321with at least one metal alloy layer C23C28/3215at least one MCrAlX layer C23C28/322only coatings of metal elements only C23C28/3225with at least one zinc-based layer C23C28/323with at least one amorphous metallic material layer C23C28/324with at least one metal matrix material layer comprising a mixture of at least two metals or metal phases or a metal-matrix material with hard embedded particles, e.g. WC-Me C23C28/325with layers graded in composition or in physical properties C23C28/34including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates C23C28/341with at least one carbide layer C23C28/343with at least one DLC or an amorphous carbon based layer, the layer being doped or not C23C28/345with at least one oxide layer C23C28/3455with a refractory ceramic layer, e.g. refractory metal oxide, ZrO₂, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer C23C28/347with layers adapted for cutting tools or wear applications C23C28/36including layers graded in composition or physical properties C23C28/40Coatings including alternating layers following a pattern, a periodic or defined repetition C23C28/42characterized by the composition of the alternating layers C23C28/44characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness C23C30/00Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process C23C26/00, C23C28/00 take precedence C23C30/005on hard metal substrates C23C2222/00 C23C2222/00Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium C23C2222/10Use of solutions containing trivalent chromium but free of hexavalent chromium C23C2222/20Use of solutions containing silanes